Rubric: Proceedings - General Proceedings

Behringer, U.

EMLC 2008

24th European Mask and Lithography Conference - Lectures held at the GMM Conference January 21-24, 2008 in Dresden, Germany

2008, CD-ROM
ISBN 978-3-8007-3079-7
Rebate

175.00 €

CD-ROM

Advanced Book Search

The three-day conference is dedicated to the science, technology, engineering and application of mask and lithography technologies and associated processes, and gives an overview of the present status in mask and lithography technologies and the future strategy where mask producers and users have the opportunity to become acquainted with new developments and results. This years sessions included: "Double Patterning”, “Simulation”, “Mask Business & Mask Data Prep”, “Mask Cleaning & Haze”, Inspection & Repair”, “Resist”, “Metrology”, “RET”, “EUV” and “NIL”. A small Poster Session was also included.

This conference proceeding contains the following papers, purchasable as PDF download with payment via credit card:


1	Mask Industry Assessment Trend Analysis Authors: Shelden, Gilbert; Marmillion, Patrica; Hughes, Greg

2	Progress of Nil Template Making Authors: Yusa, Satoshi; Hiraka, Takaaki; Mizuochi, Jun; Fujii, Akiko; Sakai, Yuko; Kuriyama, Koki; Sakaki, Masashi; Sasaki, Shiho; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

3	3-Dimensional bridged structures by thermal-UV imprint using a novel mask Authors: Okuda, Keisuke; Kawata, Hiroaki; Hirai, Yoshihiko

4	Polarization-induced astigmatism caused by topographic masks Authors: Ruoff, Johannes; Neumann, Jens Timo; Schmitt-Weaver, Emil; Setten, Eelco van; Masson, Nicolas le; Progler, Chris; Geh, Bernd; Geh, Bernd

5	Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond Authors: Kushida, Yasuyuki; Handa, Hitoshi; Maruyama, Hiroshi; Abe, Yuuki; Fujimura, Yukihiro; Yokoyama, Toshifumi

6	Double Exposure Technology for KrF Lithography Authors: Geisler, S.; Bauer, J.; Haak, U.; Stolarek, D.; Schulz, K.; Wolf, H.; Meier, W.; Trojahn, M.; Matthus, E.; Beyer, H.; Old, G.; Marschmeyer, St.; Kuck, B.

7	Wafer Based Mask Characterization for Double Patterning Lithography Authors: Kruif, Robert de; Bubke, Karsten; Janssen, Gert-Jan; Heijden, Eddy van der; Fochler, Jörg; Dusa, Mircea; Peters, Jan Hendrik; Haas, Paul de; Connolly, Brid

8	Topological and Model Based approach to Pitch decomposition for Double Patterning Authors: Nikolsky, Peter; Davydova, Natalia; Goossens, Ronald

9	Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique Authors: Shao, Feng; Evanschitzky, Peter; Reibold, David; Erdmann, Andreas

10	Three Dimensional Mask Effects in OPC Process Model Development From First Principles Simulation Authors: Melvin III, Lawrence S.; Schmoeller, Thomas; Kalus, Christian K.; Lia, Jianliang

11	Key improvement Schemes of Accuracies in EB Mask Writing for Double Patterning Lithography Authors: Sunaoshi, Hitoshi; Kamikubo, Takashi; Nishimura, Rieko; Tsuruta, Kaoru; Katsumata, Takehiko; Ohnishi, Takayuki; Anze, Hirohito; Takamatsu, Jun; Yoshitake, Shusuke; Tamamushi, Shuichi

12	Mask Data Rank (MDR) and its Application Authors: Kato, Kokoro; Endo, Masakazu; Inoue, Tadao; Yamabe, Masaki

13	MEDEA+ project 2T302 MUSCLE “Masks through user’s supply chain: leadership by excellence” Authors: Torsy, Andreas; Torsy, Andreas

14	Printing of sub resolution shots in electron beam direct write with variable shaped beam machines Authors: Thrum, Frank; Kretz, Johannes; Hohle, Christoph; Choi, Kang-Hoon; Keil, Katja

15	Assessment of molecular contamination in mask pod Authors: Foray, Jean Marie; Dejaune, Patrice; Sergent, Pierre; Gough, Stuart; Davene, Magali; Favre, Arnaud; Rude, C.; Trautmann, T.; Tissier, Michel; Cheung, D.; Fontaine, H.; Veillerot, M.; Avary, K.; Hollein, I.; Lerit, R.

16	Photomask cleaning process improvement to minimize ArF haze Authors: Graham, Michael; McDonald, Andrew

17	Theoretical Study of Mask Haze Formation Authors: Wu, Banqiu; Kumar, Ajay

18	EUV Blank Inspection Authors: Peters, J. H.; Tonk, C.; Spriegel, D.; Han, Hak-Seung; Wurm, Stefan

19	Introduction of new database reflected tritone algorithm for application in mask production Authors: Schulmeyer, Thomas; Schmalfuss, Heiko; Heumann, Jan; Lang, Michael

20	Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyond Authors: Ehrlich, Christian; Buttgereit, Ute; Boehm, Klaus; Scheruebl, Thomas; Edinger, Klaus; Bret, Tristan

21	Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR Authors: Sier, Jean-Paul; Broadbent, William; Yu, Paul

22	Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and Materials Authors: Klukowska, Anna; Vogler, Marko; Kolander, Anett; Reuther, Freimut; Gruetzner, Gabi; Muehlberger, Michael; Bergmair, Iris; Schoeftner, Rainer

23	Characterizing the imaging performance of Flash Memory masks using AIMS(TM) Authors: Setten, Eelco van; Wismans, Onno; Grim, Kees; Finders, Jo; Dusa, Mircea; Birkner, Robert; Richter, Rigo; Scherübl, Thomas

24	CDO Budgeting Authors: Nesladek, Pavel; Wiswesser, Andreas; Sass, Björn; Mauermann, Sebastian

25	High-resolution and high-precision pattern placement metrology for the 45 nm node and beyond Authors: Klose, G.; Buttgereit, U.; Arnz, M.; Rosenkranz, N.

26	Mask CD measurement approach by diffraction intensity for lithography equivalent Authors: Nagai, Takaharu; Mesuda, Kei; Sutou, Takanori; Inazuki, Yuichi; Hashimoto, Hiroyuki; Yokoyama, Toshifumi; Toyama, Nobuhito; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

27	Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node Authors: Häßler-Grohne, W.; Frase, C. G.; Gnieser, D.; Bosse, H.; Richter, J.; Wiswesser, A.

28	Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometers Authors: Wurm, M.; Diener, A.; Bodermann, B.

29	Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface Authors: Ganesan, Ramakrishnan; Youn, Seul Ki; Yun, Jei-Moon; Kim, Jin-Baek

30	Optical Proximity Correction for 0.13 µm SiGe:C BiCMOS Authors: Geisler, S.; Geisler, S.; Bauer, J.; Haak, U.; Jagdhold, U.; Pliquett, R.; Matthus, E.; Schrader, R.; Wolf, H.; Baetz, U.; Beyer, H.; Niehoff, M.

31	New alignment marks for improved measurement maturity Authors: Weidenmueller, U.; Alves, H.; Schnabel, B.; Icard, B.; Le-Denmat, J-C.; Manakli, S.; Pradelles, J.

32	Measuring Contact Hole Corner Rounding Uniformity Using Optical Scatterometry Authors: Lam, John C.; Gray, Alexander; Chen, Stanley; Richter, Jan

33	Very High Sensitivity Mask DUV Transmittance Mapping and Measurements Based on Non Imaging Optics Authors: Ben-Zvi, Guy; Dmitriev, Vladimir; Graitzer, Erez; Zait, Eitan; Sharoni, Ofir; Cohen, Avi

34	Advances in Fabrication of X-ray Masks based on Vitreous Carbon using a new UV sensitive positive Resist Authors: Voigt, Anja; Kouba, Josef; Heinrich, Marina; Gruetzner, Gabi; Scheunemann, Heinz-Ulrich; Rudolph, I.; Waberski, Christoph

35	New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA Condenser Authors: Hillmann, Frank; Scheuring, Gerd; Brück, Hans-Jürgen

36	High Resolution Patterning and Simulation on Mo/Si Multilayer for EUV Masks Authors: Tsikrikas, N.; Patsis, G. P.; Raptis, I.; Gerardino, A.

37	Phame(R) - high resolution off-axis phase shift measurements on 45nm node features Authors: Buttgereit, Ute; Perlitz, Sascha; Seidel, Dirk

38	Assessment and application of focus drilling for DRAM contact hole fabrication Authors: Noelscher, Christoph; Jauzion-Graverolle, Franck; Henkel, Thomas

39	Design of pattern-specific mask grating for giving the effect of an off-axis illumination Authors: Kim, Young-Seok; Song, Seok Ho; Lee, Jong Ung; Oh, Sung Hyun; Choi, Yong Kyoo; Kim, Munsik; O, Beom-Hoan; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol

40	Overcoming Mask Etch Challenges for 45 nm & Beyond Authors: Chandrachood, M.; Leung, T. Y. B.; Yu, K.; Grimbergen, M.; Panayil, S.; Ibrahim, I.; Sabharwal, A.; Kumar, A.

41	Desired IP Control methodology for EUV Mask in Current Mask Process Authors: Yoshitake, S.; Yoshitake, S.; Tamamushi, S.; Ogasawara, M.

42	Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasks Authors: Scholze, Frank; Laubis, Christian

43	Strategies for hybrid techniques of UV lithography and thermal nanoimprint Authors: Wissen, M.; Bogdanski, N.; Moellenbeck, S.; Scheer, H.-C.

44	Controlling Linewidth Roughness in Step and Flash Imprint Lithography Authors: Schmid, Gerard M.; Khusnatdinov, Niyaz; Brooks, Cynthia B.; LaBrake, Dwayne; Thompson, Ecron; Resnick, Douglas J.; Owens, Jordan; Ford, Arnie; Sasaki, Shiho; Toyama, Nobuhito; Kurihara, Masaaki; Hayashi, Naoya; Kobayashi, Hideo; Sato, Takashi; Nagarekawa, Osamu; Hart, Mark W.; Gopalakrishnan, Kailash; Shenoy, Rohit; Jih, Ron; Zhang, Ying; Sikorski, Edmund; Rothwell, Mary Beth; Yoshitake, Shusuke; Sunaoshi, Hitoshi; Yasui, Kenichi

45	Status of EUVL Reticle Chucking Authors: Engelstad, Roxann L.; Sohn, Jaewoong; Zeuske, Jacob R.; Battul, Venkata Siva; Vukkadala, Pradeep; Peski, Chris K. Van; Orvek, Kevin J.; Turner, Kevin T.; Mikkelson, Andrew R.; Nataraju, Madhura

46	45nm Node Registration Metrology on LTEM EUV Reticles Authors: Laske, Frank; Kinoshita, Hiroshi; Nishida, Naoki; Kenmochi, Daisuke; Ota, Hitoshi; Tanioka, Yukitake; Czerkas, Slawomir; Schmidt, Karl-Heinrich; Adam, Dieter; Roeth, Klaus-Dieter