VDE ; VDI ; GMM

EMLC 2006 -22nd European Mask and Lithography Conference EMLC (GMM-FB 49)

Lectures held at the GMM-Conference January 23-26, 2006 in Dresden, Germany

GMM-Fachbericht Band 49

2006, 352 Seiten, DIN A4, kartoniert,
ISBN 978-3-8007-2931-9

Rabatt

120,00 €

Fachbuch

Büchersuche und
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Dieser Tagungsband enthält folgende Beiträge, die Sie einzeln als PDF-Download erwerben können:


1	Mask Costs, A New Look Autoren: Grenon, Brian J.; Hector, Scott

2	The Status of LEEPL: Can it be an alternative solution? Autoren: Utsumi, Takao

3	Evaluation of quartz dry etching profile for the PSM lithography performance Autoren: Komizo, Toru; Nemoto, Satoru; Kojima, Yosuke; Ohshima, Takashi; Yoshii, Takashi; Konishi, Toshio; Chiba, Kazuaki; Kikuchi, Yasutaka; Otaki, Masao; Okuda, Yoshimitsu

4	Multi-Project Reticle Design andWafer Dicing under Uncertain Demand Autoren: Kahng, Andrew B.; Mandoiu, Ion; Xu, Xu; Zelikovsky, Alex Z.

5	Mask Industry Assessment Trend Analysis Autoren: Shelden, Gilbert; Hector, Scott; Marmillion, Patricia; Lercel, Michael

6	Iso-sciatic point: novel approach to distinguish 3-D mask effects from scanner aberrations in extreme ultraviolet lithography Autoren: Leunissen, Leonardus H. A.; Gronheid, Roel; Gao, Weimin

7	Characterizing the Response of an EUV Reticle during Electrostatic Chucking Autoren: Engelstad, Roxann L.; Lovell, Edward G.; Mikkelson, Andrew R.; Nataraju, Madhura; Ramaswamy, Vasu; Sohn, Jaewoong; Dicks, Gerald A.; Abdo, Amr Y.; Tejeda, Richard O.

8	Printability study with polarization based AIMS(TM) fab 193i to investigate mask polarization effects Autoren: Zibold, Axel; Stroessner, Ulrich; Poortinga, Eric; Schmid, Rainer; Scherübl, Thomas; Rosenkranz, Norbert; Harnisch, Wolfgang

9	Rigorous Mask Modeling beyond the Hopkins Approach Autoren: Schermer, J.; Evanschitzky, P.; Erdmann, A.

10	Consequences of Plasmonic Effects in Photomasks Autoren: Schellenberg, F. M.; Adam, K.; Matteo, J.; Hesselink, L.

11	Calibration of test masks used for lithography lens systems Autoren: Arnz, M.; Häßler-Grohne, W.; Bodermann, B.; Bosse, H.

12	Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask Autoren: Gans, F.; Liebe, R.; Heins, Th.; Richter, J.; Häßler-Grohne, W.; Frase, C. G.; Bodermann, B.; Czerkas, S.; Dirscherl, K.; Bosse, H.

13	A new life for a 10-year old MueTec2010, CD measurement system: the ultimate precision upgrade, with additional film thickness measurement capability Autoren: Cassol, Gian Luca; Bianucci, Giovanni; Murai, Shiaki; Falk, Günther; Scheuring, Gerd; Döbereiner, Stefan; Brück, Hans-Jürgen

14	Sub-110 nm line width standards for accuracy calibration of CD-SEM and CD-AFM Autoren: Shirke, Sanjay; Lorusso, Gian; Blanquies, René; Vandeweyer, Tom

15	Data Prep – The Bottleneck of Future Applications? Autoren: Gramss, Juergen; Eichhorn, Hans; Lemke, Melchior; Jaritz, Renate; Neick, Volker; Beyer, Dirk; Buerger, Bertram; Baetz, Ulrich; Kunze, Klaus; Belic, Nikola

16	Using Design Intent to Qualify and Control Lithography Manufacturing Autoren: Vasek, Jim; Wilkinson, Bill; Smith, Dave; Reich, Al; Garza, Cesar; Wiley, Jim; Zhao, Joyce; Poyastro, Moshe; Troy, Brian; Nehmadi, Youval; Abraham, Zamir

17	ORC and LfD as First Steps towards DfM Autoren: März, Reinhard; Peter, Kai; Maurer, Wilhelm

18	A New Generation of Progressive Mask Defects on the Pattern Side of Advanced Photomasks Autoren: Grenon, Brian J.; Bhattacharyya, Kaustuve; Eynon, Benjamin

19	Patterning process development for NIL templates Autoren: Sasaki, Shiho; Yoshida, Yuuichi; Amano, Tsuyoshi; Itoh, Kimio; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya

20	Plasma deposited and evaporated thin resists for template fabrication Autoren: Lavallée, Eric; Beauvais, Jacques; Mangoua, Bertrand Takam; Drouin, Dominique

21	A technique to determine capability to detect adjacent defects during the die-to-database inspection of reticle patterns Autoren: Avakaw, Syarhei; Korneliuk, Aliaksandr; Tsitko, Alena

22	Assist Feature Placement Analysis Using Focus Sensitivity Models Autoren: Melvin III, Lawrence S.; Mayhew, Jeffrey P.; Painter, Benjamin D.; Barnes, Levi D.

23	A Novel Method for the Deposition of Ultra-Uniform Resist Film for Mask Making Autoren: Schneider, J.; Picard, G.; Seye, M. F.; Pérez, Maria Helena

24	Design for Manufacturing Validation Tool - Fast and Reliable Conversion of SEM Images to GDS Images Autoren: Ronning, D.; Ducharme, D.; Selzer, R.; Boerger, B.; Yu, M.; Xing, B.; Trybendis, M.; Grenon, B.

25	Laser Mask Repair for Advanced Technologies Autoren: Dinsdale, Andrew; Robinson, Tod; Jeff LeClaire1; White, Roy; Bozak, Ron; Lee, David A.

26	High Resolution Holographic Lithography Autoren: Bratsev, V. F.; Ochkur, V. I.; Rakhovsky, V. I.; Tolmachev, Yu. A.

27	CD and Profile Metrology of Embedded Phase shift masks using Scatterometry Autoren: Lee, Kyung man; Yedur, Sanjay; Hetzer, Dave; Tavassoli, Malahat; Baik, Kiho

28	Standardisation of photomask orders: An automation perspective Autoren: Houssos, Nikos; Parchas, Evangelos; Stavroulakis, Stelios; Voyiatzis, Emmanuel; Torsy, Andreas; Filies, Olaf

29	How Refractive Microoptics Enable Lossless Hyper-NA Illumination Systems for Immersion Lithography Autoren: Ganser, H.; Darscht, M.; Miklyaev, Y.; Hauschild, D.; Aschke, L.

30	A Correlation for Predicting Film Pulling Velocity in Immersion Lithography Autoren: Schuetter, Scott; Shedd, Timothy; Doxtator, Keith; Nellis, Gregory; Peski, Chris Van

31	The Magic of 4X Mask Reduction Factor? Autoren: Lercel, Michael

32	Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography Autoren: Konishi, Toshio; Kojima, Yosuke; Okuda, Yoshimitsu; Philipsen, Vicky; Leunissen, Leonardus H. A.; Look, Lieve Van

33	Manufacturability and printability of AAPSM with transparent etch stop layer Autoren: Cangemi, Michael; Philipsen, Vicky; Ruyter, Rudi De; Leunissen, Leonardus; Morgana, Nicolo; Sixt, Pierre; Cangemi, Marc; Cottle, Rand; Kasprowicz, Bryan

34	Analysis method to determine and characterize the mask mean-to-target and uniformity specification Autoren: Lee, Sung-Woo; Leunissen, Leonardus H. A.; Kerkhove, Jeroen Van de; Philipsen, Vicky; Jonckheere, Rik; Lee, Suk-Joo; Woo, Sang-Gyun; Cho, Han-Ku; Moon, Joo-Tae

35	Mask absorber material dependence of 2D OPC in 193nm high NA lithography Autoren: Cheng, Wen-Hao; Farnsworth, Jeff