EMLC 2007

Dieser Tagungsband enthält folgende Beiträge, die Sie einzeln als PDF-Download erwerben können:


1	Optimization of Source Distribution for half-wavelength DOE Autoren: Horiguchi, Ryuji; Toyama, Nobuhito; Itoh, Kimio; Yoshida, Kouji; Kurihara, Masaaki

2	Revisiting Mask Contact Hole Measurements Autoren: Higuchia, Masaru; Gallagher, Emily; Ceperley, Daniel; Brunner, Timothy; Bowley, Reg; McGuire, Anne

3	Mask Industry Assessment Trend Analysis 2006 Autoren: Shelden, Gilbert; Marmillion, Patricia

4	Current status of water immersion lithography and prospect of higher index method Autoren: Owa, Soichi; Nakano, Katsushi; Nagasaka, Hiroyuki; Kohno, Hirotaka; Ohmura, Yasuhiro; McCallum, Martin

5	Contact angles and liquid loss behavior of high index fluids Autoren: Harder, Paul M.; Shedd, Timothy A.

6	Characteristics optimization of mask materials for Hyper-NA lithography Autoren: Morikawa, Yasutaka; Suto, Takanori; Nagai, Takaharu; Inazuki, Yuichi; Adachi, Takashi; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya

7	Investigation of Hyper-NA Scanner Emulation for Photomask CDU Performance Autoren: Poortinga, Eric; Scheruebl, Thomas; Conley, Will; Sundermann, Frank

8	Investigation on Immersion Defectivity Root Cause Autoren: Farys, V.; Gaugiran, S.; Cruau, D.; Mestadi, K.; Warrick, S.; Benndorf, M.; Feilleux, R.; Sourd, C.

9	Programmed Defects Study on masks for 45nm Immersion Lithography using the novel AIMS(TM)45-193i Autoren: Scherübl, Thomas; Dürr, Arndt C.; Böhm, Klaus; Birkner, Robert; Richter, Rigo; Strößner, Ulrich

10	Production Evaluation of Automated Reticle Defect Printability Prediction Application Autoren: Howard, William B.; Pomeroy, Scott; Moses, Raphael; Thaler, Thomas

11	A Cost Model Comparing Image Qualification Using Test Wafer and Direct Mask Inspection Autoren: Bhattacharyya, Kaustuve; Hazari, Viral; Sutherland, Doug; Higashiki, Tatsuhiko

12	Electron beam lithography simulation based on a single convolution approach – Application for sub-45nm nodes Autoren: Le denmat, J. C.; Manakli, S.; Icard, B.; Soonekindt, C.; Minghetti, B.; Le borgne, O.; Pain, L.

13	Aerial Imaging Performance of ALTA4700 Printed Mask for 130nm Design Rule Autoren: Hsu, Jyh Wei; Wu, Chun Hung; Cheng, Kevin

14	?omplete set of the special process equipment for the defect-free production of reticles Autoren: Avakaw, Syarhei; Iouditski, Valerian; Pushkin, Leanid; Tsitko, Alena

15	Mask qualification strategies in a wafer fab Autoren: Jaehnert, Carmen; Kunowski, Angela

16	Damage free megasonic resonance cleaning for the 45nm design rule Autoren: Osbome, Steve; Baudiquez, Valentine; Rode, Thomas; Chovino, Christian; Takahashi, Hidekazu; Woster, Eric

17	Resist and BARC organic outgassing measured by TD-GCMS: Investigation during the exposure or the bake steps of the lithographic process Autoren: Tiron, Raluca; Sourd, Claire; Fontaine, Hervé; Cetre, Sylviane; Mortini, Bénédicte

18	Effects of heat curing on adhesive strength between microsized SU-8 and Si substrate Autoren: Ishiyama, C.; Sone, M.; Higo, Y.

19	Evaluation of an alternative UV-NIL mold fabrication process Autoren: Voisin, P.; Voisin, P.; Voisin, P.; Leveder, T.; Zelsmann, M.; Gourgon, C.; Boussey, J.

20	New Approach for Defect Inspection on Large Area Masks Autoren: Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

21	Accelerating Physical Verification Using STPRL: a Novel Language for Test Pattern Generation Autoren: Nouh, Ahmed

22	Birefringence variation of quartz substrates during mask process Autoren: Morikawa, Yasutaka; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Yokoyama, Toshifumi; Kikuchi, Toshiharu; Kawaguchi, Atsushi; Ohkubo, Yasushi

23	A novel model building flow for the simulation of proximity effects of mask processes Autoren: Mas, Jonathan; Mittermeier, Engelbert

24	Focused Electron Beam Induced Deposition of DUV transparent SiO2 Autoren: Perentes, Alexandre; Hoffmann, Patrik; Munnik, Frans

25	Actinic inspection of sub-50 nm EUV mask blank defects Autoren: Lin, Jingquan; Weber, Nils; Maul, Jochen; Rott, Karsten; Hendel, Stefan; Merkel, Michael; Schoenhense, Gerd; Kleineberg, Ulf

26	Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer(TM) Autoren: Eklund, Robert; Österberg, Anders; Hellgren, Jonas; Fosshaug, Hans; Karlin, Tord; Newman, Tom

27	Time Resolved Evolution of the Etch Bias Autoren: Nesladek, Pavel; Paul, Jan

28	OPC Structures for Maskshops Qualification for the CMOS65nm and CMOS45nm Nodes Autoren: Sundermann, Frank; Trouiller, Yorick; Urbani, Jean-Christophe; Couderc, Christophe; Belledent, Jérôme; Borjon, Amandine; Foussadier, Franck; Gardin, Christian; LeCam, Laurent; Rody, Yves; Saied, Mazen; Yesilada, Emek; Martinelli, Catherine; Wilkinson, Bill; Vautrin, Florent; Morgana, Nicolo; Robert, Frederic; Montgomery, Patrick; Kerrien, Gurwan; Planchot, Jonathan; Farys, Vincent; Maria, Jean-Luc Di

29	Innovative Application of the RCWA Method for the Ultra-Sensitive Transmittance-Based CD Measurements on Phase-Shift Masks Autoren: Gray, Alexander; Lam, John C.; Chen, Stanley

30	The Effect of Intra-field CD Uniformity Control (CDC) on Mask Birefringence Autoren: Ben-Zvi, Guy; Zait, Eitan; Krugliakov, Vladimir; Dmitriev, Vladimir; Gottlieb, Gidi; Oshemkov, Sergey

31	Metrology capabilities and performance of the new DUV Scatterometer of the PTB Autoren: Wurm, Matthias; Bodermann, Bernd; Pilarski, Frank

32	First Measurement Data Obtained On The New Vistec LMS IPRO4 Autoren: Adam, Dieter; Boesser, Artur; Heiden, Michael; Bender, Jochen; Laske, Frank; Röth, Klaus-Dieter

33	Electron Beam Direct Write – Shaped Beam Overcomes Resolution Concerns Autoren: Stolberg, Ines; Pain, Laurent; Kretz, Johannes; Boettcher, Monika; Doering, Hans-Joachim; Gramss, Juergen; Hahmann, Peter

34	Data Preparation for EBDW Autoren: Thrum, Frank; Kretz, Johannes; Lutz, Tarek; Keil, Katja; Arndt, Christian; Choi, Kang-Hoon; Baetz, Ullrich; Belic, Nikola; Lemke, Melchior; Denker, Ulrich; Gramss, Juergen; Kliem, Karl-Heinz

35	Masks for Flash Memory Gates for the 45nm node: Binary or attenuated? Autoren: Setten, Eelco van; Engelen, Andre; Finders, Jo; Dusa, Mircea

36	Electrical Test Structures for the Characterisation of Optical Proximity Correction Autoren: Tsiamis, Andreas; Smith, Stewart; McCallum, Martin; Hourd, Andrew C.; Stevenson, J. Tom M.; Waltona, Anthony J.

37	Improvement of Model Kernel Representation in Process Simulation by Taking Pattern Correlation into account Autoren: Li, Jianliang; Yan, Qiliang; Melvin III, Lawrence S.

38	Investigation of capillary bridges growth in NIL process Autoren: Landis, Stefan; Leveder, Tanguy; Chaix, Nicolas; Gourgon, Cecile

39	Electron beam directed repair of fused silica imprint templates Autoren: Schmid, Gerard M.; Resnick, Douglas J.; Fettig, Rainer; Edinger, Klaus; Young, Steven R.; Dauksher, William J.

40	Challenges of residual layer minimisation in thermal nanoimprint lithography Autoren: Bogdanski, Nicolas; Wissen, Matthias; Möllenbeck, Saskia; Scheer, Hella-Christin

41	Hybrid nanoimprint for micro-nano mixture structure Autoren: Okuda, Keisuke; Niimi, Naoyuki; Kawata, Hiroaki; Hirai, Yoshihiko

42	Calibration of CD mask standards for the 65 nm node: CoG and MoSi Autoren: Richter, J.; Heins, T.; Liebe, R.; Bodermann, B.; Diener, A.; Bergmann, D.; Frase, C. G.; Bosse, H.

43	Characterization of photo masks by X3D AFM Autoren: Froeck, C.; Ho, M.

44	An Empirical Approach Addressing the Transfer of Mask Placement Errors During Exposure Autoren: Alles, B.; Simeon, B.; Cotte, E.; Wandel, T.; Schulz, B.; Seltmann, R.

45	Achieving Mask Order Processing Automation, Interoperability and Standardization based on P10 Autoren: Rodriguez, B.; Filies, O.; Sadran, D.; Tissier, Michel; Albin, D.; Stavroulakis, S.; Voyiatzis, E.

46	Benchmark and gap analysis of current mask carriers vs future requirements: example of the carrier contamination Autoren: Fontaine, H.; Davenet, M.; Cheung, D.; Hoellein, I.; Richsteiger, P.; Dejaune, P.; Torsy, A.

47	Reticle Haze: An Industrial Approach Autoren: Gough, Stuart; Gérard, Xavier; Bichebois, Pascal; Roche, Agnès; Sundermann, Frank; Guyader, Véronique; Bièron, Yann; Galvier, Jean; Nicoleau, Serge

48	Fast near field simulation of optical and EUV masks using the waveguide method Autoren: Evanschitzky, Peter; Erdmann, Andreas

49	EUV mask infrastructure challenges Autoren: Wurm, Stefan; Seidel, Phil; Peski, Chris Van; He, Long; Han, Hakseung; Kearney, Pat; Cho, Wonil

50	Enabling Defect-free Masks for Extreme Ultraviolet Lithography Autoren: Jeon, Chan-Uk; Kearney, Patrick; Ma, Andy; Randive, Rajul; Reiss, Ira; Beier, Bernd; Uno, Toshiyuki

51	Hydrogenated water application for particle removal on EUV mask blank substrates Autoren: Eichenlaub, Sean; Rastegar, Abbas; Dress, Peter; Xu, Fei; Marmillion, Pat

52	Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future Autoren: Jonckheere, R.; Lorusso, G. F.; Goethals, A.; Ronse, K.; Hermans, J.; Ruyter, R. De

53	Predicting and Correcting for Image Placement Errors during the Fabrication of EUVL Masks Autoren: Engelstad, R.; Sohn, J.; Mikkelson, A.; Nataraju, M.; Turner, K.

54	Status Report on EUV Source Development and EUV Source Applications in EUVL Autoren: Bakshi, Vivek; Lebert, Rainer; Jägle, Bernhard; Wies, Christian; Stamm, Uwe; Kleinschmidt, Juergen; Schriever, Guido; Ziener, Christian; Corthout, Marc; Pankert, Joseph; Bergmann, Klaus; Neff, Willi; Egbert, André; Gustafson, Debbie

55	Surface chemistry of Ru: relevance to optics lifetime in EUVL Autoren: Wasielewski, R.; Yakshinskiy, B. V.; Hedhili, M. N.; Ciszewski, A.; Madey, T. E.

56	Progress in EUV Photoresist Technology Autoren: Wallow, Thomas I.; Kim, Ryoung-han; Fontaine, Bruno La; Naulleau, Patrick P.; Anderson, Chris N.; Sandberg, Richard L.

57	Quantitative Measurement of EUV Resist Outgassing Autoren: Denbeaux, Greg; Garg, Rashi; Waterman, Justin; Mbanaso, Chimaobi; Netten, Jeroen; Brainard, Robert; Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; DeMarco, Kevin; Jaffe, Molly; Waldron, Matthew; Dean, Kim

1

Optimization of Source Distribution for half-wavelength DOE

Autoren:

Horiguchi, Ryuji; Toyama, Nobuhito; Itoh, Kimio; Yoshida, Kouji; Kurihara, Masaaki

2

Revisiting Mask Contact Hole Measurements

Autoren:

Higuchia, Masaru; Gallagher, Emily; Ceperley, Daniel; Brunner, Timothy; Bowley, Reg; McGuire, Anne

3

Mask Industry Assessment Trend Analysis 2006

Autoren:

Shelden, Gilbert; Marmillion, Patricia

4

Current status of water immersion lithography and prospect of higher index method

Autoren:

Owa, Soichi; Nakano, Katsushi; Nagasaka, Hiroyuki; Kohno, Hirotaka; Ohmura, Yasuhiro; McCallum, Martin

5

Contact angles and liquid loss behavior of high index fluids

Autoren:

Harder, Paul M.; Shedd, Timothy A.

6

Characteristics optimization of mask materials for Hyper-NA lithography

Autoren:

Morikawa, Yasutaka; Suto, Takanori; Nagai, Takaharu; Inazuki, Yuichi; Adachi, Takashi; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya

7

Investigation of Hyper-NA Scanner Emulation for Photomask CDU Performance

Autoren:

Poortinga, Eric; Scheruebl, Thomas; Conley, Will; Sundermann, Frank

8

Investigation on Immersion Defectivity Root Cause

Autoren:

Farys, V.; Gaugiran, S.; Cruau, D.; Mestadi, K.; Warrick, S.; Benndorf, M.; Feilleux, R.; Sourd, C.

9

Programmed Defects Study on masks for 45nm Immersion Lithography using the novel AIMS(TM)45-193i

Autoren:

Scherübl, Thomas; Dürr, Arndt C.; Böhm, Klaus; Birkner, Robert; Richter, Rigo; Strößner, Ulrich

10

Production Evaluation of Automated Reticle Defect Printability Prediction Application

Autoren:

Howard, William B.; Pomeroy, Scott; Moses, Raphael; Thaler, Thomas

11

A Cost Model Comparing Image Qualification Using Test Wafer and Direct Mask Inspection

Autoren:

Bhattacharyya, Kaustuve; Hazari, Viral; Sutherland, Doug; Higashiki, Tatsuhiko

12

Electron beam lithography simulation based on a single convolution approach – Application for sub-45nm nodes

Autoren:

Le denmat, J. C.; Manakli, S.; Icard, B.; Soonekindt, C.; Minghetti, B.; Le borgne, O.; Pain, L.

13

Aerial Imaging Performance of ALTA4700 Printed Mask for 130nm Design Rule

Autoren:

Hsu, Jyh Wei; Wu, Chun Hung; Cheng, Kevin

14

?omplete set of the special process equipment for the defect-free production of reticles

Autoren:

Avakaw, Syarhei; Iouditski, Valerian; Pushkin, Leanid; Tsitko, Alena

15

Mask qualification strategies in a wafer fab

Autoren:

Jaehnert, Carmen; Kunowski, Angela

16

Damage free megasonic resonance cleaning for the 45nm design rule

Autoren:

Osbome, Steve; Baudiquez, Valentine; Rode, Thomas; Chovino, Christian; Takahashi, Hidekazu; Woster, Eric

17

Resist and BARC organic outgassing measured by TD-GCMS: Investigation during the exposure or the bake steps of the lithographic process

Autoren:

Tiron, Raluca; Sourd, Claire; Fontaine, Hervé; Cetre, Sylviane; Mortini, Bénédicte

18

Effects of heat curing on adhesive strength between microsized SU-8 and Si substrate

Autoren:

Ishiyama, C.; Sone, M.; Higo, Y.

19

Evaluation of an alternative UV-NIL mold fabrication process

Autoren:

Voisin, P.; Voisin, P.; Voisin, P.; Leveder, T.; Zelsmann, M.; Gourgon, C.; Boussey, J.

20

New Approach for Defect Inspection on Large Area Masks

Autoren:

Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

21

Accelerating Physical Verification Using STPRL: a Novel Language for Test Pattern Generation

Autoren:

Nouh, Ahmed

22

Birefringence variation of quartz substrates during mask process

Autoren:

Morikawa, Yasutaka; Kitahata, Yasuhisa; Yokoyama, Toshifumi; Yokoyama, Toshifumi; Kikuchi, Toshiharu; Kawaguchi, Atsushi; Ohkubo, Yasushi

23

A novel model building flow for the simulation of proximity effects of mask processes

Autoren:

Mas, Jonathan; Mittermeier, Engelbert

24

Focused Electron Beam Induced Deposition of DUV transparent SiO2

Autoren:

Perentes, Alexandre; Hoffmann, Patrik; Munnik, Frans

25

Actinic inspection of sub-50 nm EUV mask blank defects

Autoren:

Lin, Jingquan; Weber, Nils; Maul, Jochen; Rott, Karsten; Hendel, Stefan; Merkel, Michael; Schoenhense, Gerd; Kleineberg, Ulf

26

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer(TM)

Autoren:

Eklund, Robert; Österberg, Anders; Hellgren, Jonas; Fosshaug, Hans; Karlin, Tord; Newman, Tom

27

Time Resolved Evolution of the Etch Bias

Autoren:

Nesladek, Pavel; Paul, Jan

28

OPC Structures for Maskshops Qualification for the CMOS65nm and CMOS45nm Nodes

Autoren:

Sundermann, Frank; Trouiller, Yorick; Urbani, Jean-Christophe; Couderc, Christophe; Belledent, Jérôme; Borjon, Amandine; Foussadier, Franck; Gardin, Christian; LeCam, Laurent; Rody, Yves; Saied, Mazen; Yesilada, Emek; Martinelli, Catherine; Wilkinson, Bill; Vautrin, Florent; Morgana, Nicolo; Robert, Frederic; Montgomery, Patrick; Kerrien, Gurwan; Planchot, Jonathan; Farys, Vincent; Maria, Jean-Luc Di

29

Innovative Application of the RCWA Method for the Ultra-Sensitive Transmittance-Based CD Measurements on Phase-Shift Masks

Autoren:

Gray, Alexander; Lam, John C.; Chen, Stanley

30

The Effect of Intra-field CD Uniformity Control (CDC) on Mask Birefringence

Autoren:

Ben-Zvi, Guy; Zait, Eitan; Krugliakov, Vladimir; Dmitriev, Vladimir; Gottlieb, Gidi; Oshemkov, Sergey

31

Metrology capabilities and performance of the new DUV Scatterometer of the PTB

Autoren:

Wurm, Matthias; Bodermann, Bernd; Pilarski, Frank

32

First Measurement Data Obtained On The New Vistec LMS IPRO4

Autoren:

Adam, Dieter; Boesser, Artur; Heiden, Michael; Bender, Jochen; Laske, Frank; Röth, Klaus-Dieter

33

Electron Beam Direct Write – Shaped Beam Overcomes Resolution Concerns

Autoren:

Stolberg, Ines; Pain, Laurent; Kretz, Johannes; Boettcher, Monika; Doering, Hans-Joachim; Gramss, Juergen; Hahmann, Peter

34

Data Preparation for EBDW

Autoren:

Thrum, Frank; Kretz, Johannes; Lutz, Tarek; Keil, Katja; Arndt, Christian; Choi, Kang-Hoon; Baetz, Ullrich; Belic, Nikola; Lemke, Melchior; Denker, Ulrich; Gramss, Juergen; Kliem, Karl-Heinz

35

Masks for Flash Memory Gates for the 45nm node: Binary or attenuated?

Autoren:

Setten, Eelco van; Engelen, Andre; Finders, Jo; Dusa, Mircea

36

Electrical Test Structures for the Characterisation of Optical Proximity Correction

Autoren:

Tsiamis, Andreas; Smith, Stewart; McCallum, Martin; Hourd, Andrew C.; Stevenson, J. Tom M.; Waltona, Anthony J.

37

Improvement of Model Kernel Representation in Process Simulation by Taking Pattern Correlation into account

Autoren:

Li, Jianliang; Yan, Qiliang; Melvin III, Lawrence S.

38

Investigation of capillary bridges growth in NIL process

Autoren:

Landis, Stefan; Leveder, Tanguy; Chaix, Nicolas; Gourgon, Cecile

39

Electron beam directed repair of fused silica imprint templates

Autoren:

Schmid, Gerard M.; Resnick, Douglas J.; Fettig, Rainer; Edinger, Klaus; Young, Steven R.; Dauksher, William J.

40

Challenges of residual layer minimisation in thermal nanoimprint lithography

Autoren:

Bogdanski, Nicolas; Wissen, Matthias; Möllenbeck, Saskia; Scheer, Hella-Christin

41

Hybrid nanoimprint for micro-nano mixture structure

Autoren:

Okuda, Keisuke; Niimi, Naoyuki; Kawata, Hiroaki; Hirai, Yoshihiko

42

Calibration of CD mask standards for the 65 nm node: CoG and MoSi

Autoren:

Richter, J.; Heins, T.; Liebe, R.; Bodermann, B.; Diener, A.; Bergmann, D.; Frase, C. G.; Bosse, H.

43

Characterization of photo masks by X3D AFM

Autoren:

Froeck, C.; Ho, M.

44

An Empirical Approach Addressing the Transfer of Mask Placement Errors During Exposure

Autoren:

Alles, B.; Simeon, B.; Cotte, E.; Wandel, T.; Schulz, B.; Seltmann, R.

45

Achieving Mask Order Processing Automation, Interoperability and Standardization based on P10

Autoren:

Rodriguez, B.; Filies, O.; Sadran, D.; Tissier, Michel; Albin, D.; Stavroulakis, S.; Voyiatzis, E.

46

Benchmark and gap analysis of current mask carriers vs future requirements: example of the carrier contamination

Autoren:

Fontaine, H.; Davenet, M.; Cheung, D.; Hoellein, I.; Richsteiger, P.; Dejaune, P.; Torsy, A.

47

Reticle Haze: An Industrial Approach

Autoren:

Gough, Stuart; Gérard, Xavier; Bichebois, Pascal; Roche, Agnès; Sundermann, Frank; Guyader, Véronique; Bièron, Yann; Galvier, Jean; Nicoleau, Serge

48

Fast near field simulation of optical and EUV masks using the waveguide method

Autoren:

Evanschitzky, Peter; Erdmann, Andreas

49

EUV mask infrastructure challenges

Autoren:

Wurm, Stefan; Seidel, Phil; Peski, Chris Van; He, Long; Han, Hakseung; Kearney, Pat; Cho, Wonil

50

Enabling Defect-free Masks for Extreme Ultraviolet Lithography

Autoren:

Jeon, Chan-Uk; Kearney, Patrick; Ma, Andy; Randive, Rajul; Reiss, Ira; Beier, Bernd; Uno, Toshiyuki

51

Hydrogenated water application for particle removal on EUV mask blank substrates

Autoren:

Eichenlaub, Sean; Rastegar, Abbas; Dress, Peter; Xu, Fei; Marmillion, Pat

52

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Autoren:

Jonckheere, R.; Lorusso, G. F.; Goethals, A.; Ronse, K.; Hermans, J.; Ruyter, R. De

53

Predicting and Correcting for Image Placement Errors during the Fabrication of EUVL Masks

Autoren:

Engelstad, R.; Sohn, J.; Mikkelson, A.; Nataraju, M.; Turner, K.

54

Status Report on EUV Source Development and EUV Source Applications in EUVL

Autoren:

Bakshi, Vivek; Lebert, Rainer; Jägle, Bernhard; Wies, Christian; Stamm, Uwe; Kleinschmidt, Juergen; Schriever, Guido; Ziener, Christian; Corthout, Marc; Pankert, Joseph; Bergmann, Klaus; Neff, Willi; Egbert, André; Gustafson, Debbie

55

Surface chemistry of Ru: relevance to optics lifetime in EUVL

Autoren:

Wasielewski, R.; Yakshinskiy, B. V.; Hedhili, M. N.; Ciszewski, A.; Madey, T. E.

56

Progress in EUV Photoresist Technology

Autoren:

Wallow, Thomas I.; Kim, Ryoung-han; Fontaine, Bruno La; Naulleau, Patrick P.; Anderson, Chris N.; Sandberg, Richard L.

57

Quantitative Measurement of EUV Resist Outgassing

Autoren:

Denbeaux, Greg; Garg, Rashi; Waterman, Justin; Mbanaso, Chimaobi; Netten, Jeroen; Brainard, Robert; Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; DeMarco, Kevin; Jaffe, Molly; Waldron, Matthew; Dean, Kim

VDE ; VDI ; GMM