1
Ion Beam Deposition for Defect-Free EUVL Mask Blanks
Autoren:
Kearney, Patrick; Lin, C. C.; Yun, Henry; Randive, Rajul; Reiss, Ira; Hayes, Alan; Mirkarimi, Paul
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
2
Lithography Development and Research Challenges for the = 22 nm Half-pitch
Autoren:
Wurm, Stefan
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
3
Lithography light source challenges for Double Patterning and EUVL
Autoren:
Farrar, Nigel R.; Lalovic, Ivan; Brandt, David; Brown, Daniel
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
4
MAPPER: High Throughput Maskless Lithography
Autoren:
Kuiper, V.; Kampherbeek, B. J.; Wieland, M. J.; Boer, G. de; Berge, G. F. ten; Boers, J.; Jager, R.; Peut, T. van de; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; Veen, A. H. V. van
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
5
Mask contribution on CD & OVL errors budgets for Double Patterning Lithography
Autoren:
Servin, I.; Lapeyre, C.; Barnola, S.; Connolly, B.; Ploss, R.; Nakagawa, K.; Buck, P.; McCallum, M.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
6
Mask Industry Assessment Trend Analysis
Autoren:
Hughes, Greg; Yun, Henry
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
7
Mask parameter variation in the context of the overall variation budget of an advanced logic wafer Fab
Autoren:
Seltmann, Rolf; Burbach, Gert; Parge, Anne; Busch, Jens; Hertzsch, Tino; Poock, Andre; Weisbuch, Francois; Holfeld, Andre
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
8
Mask salvage in the age of capital contraction
Autoren:
Kimmel, Kurt R.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
9
MeRiT(R) repair verification using in-die phase metrology Phame(R)
Autoren:
Buttgereit, Ute; Birkner, Robert; Stelzner, Robert
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
10
Molecular dynamics study on mold fracture by nano scale defects in nanoimprint lithography
Autoren:
Tada, K.; Yasuda, M.; Fujii, N.; Kawata, H.; Hirai, Y.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
11
Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration Metrol
Autoren:
Arnz, M.; Klose, G.; Troll, G.; Beyer, D.; Mueller, A.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
12
Mounting Methodologies to Measure EUV Reticle Nonflatness
Autoren:
Battula, Venkata Siva; Zeuske, Jacob R.; Engelstad, Roxann L.; Vukkadala, Pradeep; Mikkelson, Andrew R.; Peski, Chris K. Van
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
13
New methods and processes based on advanced vacuum technology for photomask decontamination
Autoren:
Foray, J. M.; Bellet, B.; HadjRabah, S.; Palisson, J.; Veran, E.; Davenet, M.; Favre, A.; Sergent, P.; Tissier, M.; Baudiquez, V.; Nesladek, P.; Foca, E.; Gopalakrishnan, S.; Hollein, I.; Dufaye, F.; Gough, S.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
14
New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodes
Autoren:
Martin, L.; Manakli, S.; Icard, B.; Pradelles, J.; Orobtchouk, Régis; Poncet, Alain; Pain, L.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
15
Nuisance Event Reduction Using Sensitivity Control Layers (SCL) for Advanced Photomask Inspection
Autoren:
Hedges, Shad; Le, Chin; Eickhoff, Mark; Wylie, Mark; Simmons, Tim; Vellanki, Venu; McMurran, Jeff
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
16
Particle transport and reattachment on a mask surface
Autoren:
Nesladek, Pavel; Osborne, Steve; Kohl, Christian
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
17
Reduced Pellicle Impact on Overlay using High Order Intrafield Grid Corrections
Autoren:
Kruif, Robert de; Rhee, Tasja van; Heijden, Eddy van der
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
18
Registration Metrology on Double Patterning Reticles
Autoren:
Schmidt, Karl-Heinrich; Röth, Klaus-Dieter; Laske, Frank; Bender, Jochen; Adam, Dieter; Ache, Oliver
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
19
Residual-free imprint for sensor definition
Autoren:
Mayer, A.; Bogdanski, N.; Möllenbeck, S.; Scheer, H.-C.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference
20
Resolution capability of EBM-6000 and EBM-7000 for Nano-imprint template
Autoren:
Yoshitake, S.; Kamikubo, T.
Konferenz:
EMLC 2009 - 25th European Mask and Lithography Conference