1
Surface adsorption mechanism of water-soluble polymer in polishing slurry
Authors:
Tsuchiya, Kohsuke; Takahashi, Shuhei; Kubo, Megumi; Morinaga, Hitoshi
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
2
The effect of H2O2 and Ammonia sulfate on the CMP of Molybdenum
Authors:
Chen, Fei; Zeng, Xu; Xu, Jing-Bo; Lu, Hai-Sheng; Qu, Xin-Ping
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
3
The Study of POU Filters Performance and Life-time in the CMP Slurry Supply System
Authors:
Jang, Sunjae; Lim, Donghyun; Ji Chul Yang; Kim, Hojoong; Nam, Miyeon; Kim, Taesung
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
4
The Study to Minimize the Variation of Polishing Time According to the Pad Used Time
Authors:
Yang, Ji Chul; Jang, Won Moon; Won, Jae-Hyung
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
5
The Synergetic Effect of Polishing Debris Cleaning in Real-time
Authors:
Kim, Hojoong; Kim, Mingu; Qin, Hongyi; Yang, Ji Chul; Lim, Donghyun; Choi, Hoomi; Kim, Taesung
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
6
The Synthesis of PS-Si02 Raspberry Structure Nanopartide for CMP Slurry
Authors:
Qin, Hongyi; Kim, Hojoong; Choi, Hoomi; Kim, Mingu; Kim, Taesung
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
7
Topography Understanding of Tungsten Chemical Mechanical Polishing for Advanced Technology
Authors:
Yu, Hong; Moon, Yongsik; Liu, Huang
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
8
Tribological, Thermal, and Kinetic Attributes of 300 vs. 450 mm Chemical Mechanical Planarization Processes
Authors:
Jiao, Yubo; Liao, Xiaoyan; Wu, Changhong; Zhuang, Yun; Sampurno, Yasa; Theng, Siannie; Godlstein, Michael; Philipossian, Ara
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology
9
TSV CMP Process Development and Pitting Defect Reduction
Authors:
Lin, Paul-Chang; Xu, Jinhai; Li, Pei; Ding, Yujie; Ma, Zhiyong; Xing, Charles; Jing, Judy; Wang, Yuchun
Conference:
ICPT 2012 - International Conference on Planarization / CMP Technology