CRYSTAL Project: A Contribution to control Cycle Time excursion in Litho area
Conference: EMLC 2009 - 25th European Mask and Lithography Conference
01/12/2009 - 01/15/2009 at Dresden, Germany
Proceedings: EMLC 2009
Pages: 2Language: englishTyp: PDF
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Authors:
Tissier, Michel (Toppan Photomasks)
Beisser, Eric (Xyalis)
Davenet, Magali (Adixen)
Garcia, Patrick; Au, David (Atmel)
Quere, Yves (CEA-LETI)
Finck, François (STM)
Silova, Mariana (ASML)
Hoellein, Ingo (AMTC)
Abstract:
In order to stay competitive, the European semiconductor industry does not only have to master new technologies, but also has to do that with optimal time to market and cost characteristics. An European MEDEA+ project named CRYSTAL 2T307 has started in 2008 to address some key issues related to Litho area: A critical element in this context is the mask supply chain for 193nm lithography, a topic for which this project aims for substantial improvements by executing cooperative research work on two areas of concern: How to decrease cycle time excursions (due to photomasks manufacturability issues with focus on mask DFM and evolutive defects) and to simplify photomask qualification procedures (focus on photomask process changes).