Simulation of lithographic processes for fabrication of nanostructures

Conference: Mikro-Nano-Integration - 1. GMM-Workshops
03/12/2009 - 03/13/2009 at Seeheim, Germany

Proceedings: Mikro-Nano-Integration

Pages: 6Language: englishTyp: PDF

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Erdmann, Andreas; Fühner, Tim; Evanschitzky, Peter; Liu, Shijie (Fraunhofer Institute of Integrated Systems and Device Technology (IISB), Schottkystrasse 10, 91058 Erlangen, Germany)

processes in semiconductor fabrication. Rigorous electromagnetic field solvers such as rigorous coupled wave algorithms (RCWA) and finite-difference time-domain (FDTD) algorithms in combination with vector imaging models are applied to predict the image formation inside the photoresist. Semi-empirical macroscopic and microscopic models are used to describe physical and chemical phenomena during the processing of resists. Various local and global optimization techniques are used to identify the best exposure and processing parameters. This contribution demonstrates the application of the development and research lithography simulator Dr.LiTHO for the modeling of alternative lithographic methods which are used in micro- and nanofabrication.