FullVision™ Endpoint for CMP of SiGe Fin Structures
Conference: ICPT 2012 - International Conference on Planarization / CMP Technology
10/15/2012 - 10/17/2012 at Grenoble, France
Proceedings: ICPT 2012
Pages: 5Language: englishTyp: PDF
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Authors:
Menk, G.; Dhandapani, S.; Huang, Y.-C.; Wood, B.; Qian, J.; Cherian, B.; Garretson, C.; Osterheld, T. (Chemical Mechanical Planarization Business Unit, Silicon Systems Group, Applied Materials, 3050 Bowers Ave, Santa Clara, CA 95054, USA)
Abstract:
FullVision(TM) is a real time, in situ optical endpoint system that enables the polish of SiGe fin structures with superior planarization performance. A production-proven endpoint tool for stop-in-film and stop-on-film applications, FullVision(TM) has been demonstrated for use in the CMP of advanced channel material films deposited by selective epitaxy. Keywords: Endpoint, FullVision(TM), Chemical-mechanical Polishing, FinFET, SiGe