Wafer- and membrane-based plasmonic sensor surfaces for ultrasensitive molecular spectroscopy
Conference: Mikro-Nano-Integration - 6. GMM-Workshop
10/05/2016 - 10/06/2016 at Duisburg, Deutschland
Proceedings: Mikro-Nano-Integration
Pages: 6Language: englishTyp: PDF
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Authors:
Huebner,Uwe; Mayerhoefer, Thomas G.; Knipper, Richard; Patze, Sophie (Leibniz-Institut für Photonische Technologien e.V., Postfach 100239, 07702 Jena, Germany)
Cialla-May, Dana; Weber, Karina; Popp, Juergen (Leibniz-Institut für Photonische Technologien e.V., Postfach 100239, 07702 Jena, Germany & Institut für Physikalische Chemie und Abbe Center of Photonics, Friedrich-Schiller Universität Jena, Helmholtzweg 4, 07743 Jena, Germany & InfectoGnostics Forschungscampus Jena, Zentrum für Angewandte Forschung, Philosophenweg 7, 07743 Jena, Germany)
Abstract:
Character Projection (CP) e-beam lithography is a special lithographic method which allows top-down fabrication of nanopattern on wafer scale. Due to a drastic reduction in writing time it supports ideas from basic research to the application level. We demonstrate the potential of the combined Character Projection & Shaped Beam electron beam lithography for establishing the wafer scale fabrication of plasmonic nanopattern for sensor surfaces used in chip-based surface-enhanced vibrational spectroscopy (SERS - surface enhanced Raman scattering, SEIRA - surface enhanced infrared absorption).