Highly ordered silicon nanopillar by nanoparticle lithography
Conference: Mikro-Nano-Integration - 6. GMM-Workshop
10/05/2016 - 10/06/2016 at Duisburg, Deutschland
Proceedings: Mikro-Nano-Integration
Pages: 5Language: englishTyp: PDF
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Authors:
Hamdana, Gerry; Bertke, Maik; Wasisto, Hutomo Suryo; Peiner, Erwin (Institute of Semiconductor Technology, Technische Universität Braunschweig, 38106 Braunschweig, Germany & Laboratory for Emerging Nanotechnology (LENA), 38106 Braunschweig, Germany)
Südkamp, Tobias; Bracht, Hartmut (Institute of Material Physics, Westfällische Universität Münster, 48149 Münster, Germany)
Abstract:
Large-area silicon nanostructure arrays were prepared by polystyrene spheres as processing mask. Utilizing a mesh array prepared by photolithography, the area of nanofabrication was pre-defined. More importantly, the fabricated lithographic structure and an improved hydrophilic surface enhanced the sphere transfer process. Therefore, the ordering depended not only on self-assembly but also could be controlled by mesh characteristics. Nanofabrication was performed by inductively coupled plasma (ICP) reactive ion etching (RIE) at cryogenic temperature.