Study on effect of different complexing agents and inhibitors on Co corrosion in H2O2 based alkaline solution by EQCM

Conference: ICPT 2017 - International Conference on Planarization/CMP Technology
10/11/2017 - 10/13/2017 at Leuven, Belgium

Proceedings: ICPT 2017

Pages: 5Language: englishTyp: PDF

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Authors:
He, Peng; Yang, Guang; Qu, Xin-Ping (State key lab of ASIC and system, School of Microelectronics, Fudan University, Shanghai, 200433, China)

Abstract:
In this work, the dissolution and corrosion of cobalt (Co) films were investigated using solutions of aqueous mixtures of oxidant H2O2, and different inhibitors (1, 2, 4-triazole (TAZ), nicotinic acid (NA) and benzotriazole) and complexing agents (glycine (GLY), citric acid (CA), and ascorbic acid (AA)). The mass change was measured by using electrochemical quartz crystal microbalance (EQCM), meanwhile, the open circuit potential (OCP) was measured though EQCM by using electrochemical workstation. It is found that BTA and TAZ can adsorb on the surface of Co and prevent Co from corrosion, and GLY, CA, AA would promote the dissolution of Co oxide/hydroxide. NA would form a complex layer and inhibited the Co corrosion. The measurement of zero resistance galvanometer (ZRA) method show that, combination of 10 mM/L NA and 5 mM/L TAZ can reduce the galvanic corrosion of Co-Cu to minimal. . Keywords: Cobalt, Complexing Agent, Electrochemical Quartz Crystal Microbalance, Chemical Mechanical Polishing