Consequences of Plasmonic Effects in Photomasks

Conference: EMLC 2006 - 22nd European Mask and Lithography Conference
01/23/2006 - 01/26/2006 at Dresden, Germany

Proceedings: EMLC 2006

Pages: 2Language: englishTyp: PDF

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Schellenberg, F. M.; Adam, K. (Mentor Graphics, 1001 Ridder Park Dr., San Jose, CA, 95131)
Matteo, J.; Hesselink, L. (Stanford University, Stanford, CA 94305)

In the implementation of most resolution enhancement techniques (RET) for optical lithography, full 3-D simulation of the wave propagation and scattering through the mask apertures must be computed for situations when ‘scalar’ approximations no longer hold. Using commercial 3-D electromagnetic solvers such as the program TEMPEST, some topography effects due to scattering, such as the intensity imbalance observed in phase masks, can be accurately predicted.