ORC and LfD as First Steps towards DfM
Conference: EMLC 2006 - 22nd European Mask and Lithography Conference
01/23/2006 - 01/26/2006 at Dresden, Germany
Proceedings: EMLC 2006
Pages: 5Language: englishTyp: PDF
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Authors:
März, Reinhard; Peter, Kai; Maurer, Wilhelm (Infineon Technologies AG, Munich, Germany)
Abstract:
The role the Optical Rule Check (ORC) in the design flow and future directions are discussed, the benefit of the model-based methodology is illustrated by using realistic layout situations. Concepts for implementation of Litho-friendly Design (LfD), i.e., of layout optimization and lithography simulations in the pre-tapeout design flow are developed.