High Resolution Holographic Lithography

Conference: EMLC 2006 - 22nd European Mask and Lithography Conference
01/23/2006 - 01/26/2006 at Dresden, Germany

Proceedings: EMLC 2006

Pages: 5Language: englishTyp: PDF

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Bratsev, V. F.; Ochkur, V. I.; Rakhovsky, V. I.; Tolmachev, Yu. A. (EXACTNESS LLC, Moscow, Russia)

The possibility to obtain the image with resolution essentially better than that of the hologram from which this image was recovered, is experimentally confirmed. The method of calculation and quantization of the holograms of flat objects of various configurations is formulated that takes into account peculiar features of the optical set scheme, appropriate softwear has been developed. We have realized the techniques for preparation of such holograms with the electron lithographer and for recovering of the image on the photoresist with resolution one order of magnitude better than the spatial element of the hologram. The minimum resolution of the method matches the estimation given by the diffraction theory for microscopic objects.