?omplete set of the special process equipment for the defect-free production of reticles
Conference: EMLC 2007 - 23rd European Mask and Lithography Conference
01/22/2007 - 01/26/2007 at Grenoble, France
Proceedings: EMLC 2007
Pages: 9Language: englishTyp: PDFPersonal VDE Members are entitled to a 10% discount on this title
Avakaw, Syarhei; Iouditski, Valerian; Pushkin, Leanid; Tsitko, Alena (UE "KBTEM-OMO" of "Planar", Partizansky Ave., 2, 220763 Minsk, Republic of Belarus)
The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: - Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR. - Advantages in the development of a complete set of the special process equipment. Without taking into account technical and chemical processes, this complete set includes three component parts: - Multi-beam laser pattern generator; - Die-to-Database reticle inspection system; - Laser reticle repair system.