First Measurement Data Obtained On The New Vistec LMS IPRO4
Conference: EMLC 2007 - 23rd European Mask and Lithography Conference
01/22/2007 - 01/26/2007 at Grenoble, France
Proceedings: EMLC 2007
Pages: 7Language: englishTyp: PDF
Personal VDE Members are entitled to a 10% discount on this title
Authors:
Adam, Dieter; Boesser, Artur; Heiden, Michael; Bender, Jochen; Laske, Frank; Röth, Klaus-Dieter (Vistec Semiconductor Systems GmbH)
Abstract:
The development of reticles for the 65nm node is already completed and development is ongoing at the leading edge mask shops for 45nm technology node reticles. The specifications for 45 nm node reticles CD homogeneity, CD mean to target, and registration (Overlay) are much tighter than previous generation reticles. As a result of the new requirements new metrology systems will be required which provide significantly improved measurement performance compared to currently available systems. The Vistec LMS IPRO4 is the new generation registration metrology system under final development. Initial performance data of the α tool is reported and the planned major hardware and software improvements are described.