Technology development for 1 megapixel-micromirror arrays with high optical fill factor and stable analogue deflection

Conference: MikroSystemTechnik - KONGRESS 2007
10/15/2007 - 10/17/2007 at Dresden, Germany

Proceedings: MikroSystemTechnik

Pages: 4Language: englishTyp: PDF

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Schmidt, Jan-Uwe; Friedrichs, Martin; Rudloff, Dirk; Lakner, Hubert (Fraunhofer Institute for Photonic Microsystems (IPMS), Maria-Reiche-Strasse 2, Dresden, Germany)
Bakke, Thor (SINTEF ICT, MiNaLab, P.O. Box 124 Blindern, NO-0314 Oslo, Norway)
Voelker, Benjamin (AEMtec GmbH, Carl-Scheele-Strasse 16, D-12489 Berlin, Germany)

At Fraunhofer IPMS Dresden micromechanical mirror arrays are developed and fabricated in small-volume using a high-voltage CMOS process for applications such as lithographic mask writers and adaptive optics. Different approaches for the fabrication of micromechanical mirror arrays with up to 1 million analogue addressable pixels in a MEMS-on-CMOS technology are discussed: sacrificial layer technologies of 1-level actuators made from a single Al-TiAl-Al structural multilayer or 2-level actuators with an additional TiAl hinge layer respectively. Also the fabrication of single crystalline Si micro-mirrors using layer-transfer bonding is discussed.