The Study of CVD diamond conditioner
Conference: ICPT 2007 - International Conference on Planarization / CMP Technology
10/25/2007 - 10/27/2007 at Dresden, Germany
Proceedings: ICPT 2007
Pages: 5Language: englishTyp: PDF
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Authors:
Rikita, Naoki; Matsuki, Ryuichi; Kobayashi, Hiroyuki; Nakamura, Masato; Chida, Kasumi (Mitsubishi Materials Corporation, 1-297, Kitabukuro-cho, Omiya-ku, Saitama-shi, Saitama, 330-8508, Japan)
Abstract:
Mitsubishi Materials developed CVD diamond conditioner for the purpose of anti corrosion. In our long history of Ni plated CMP diamond conditioner, our main stream was dot-designed conditioner. Such dot type Ni plated conditioners were used by many customers. However, customer is concerning of metal contamination for the next generation device. That is the motivation to develop CVD conditioner.