Improvements of Electrical and Optical Property of Organic Light Emitting Diode using Chemical Mechanical Polishing Process
Conference: ICPT 2007 - International Conference on Planarization / CMP Technology
10/25/2007 - 10/27/2007 at Dresden, Germany
Proceedings: ICPT 2007
Pages: 6Language: englishTyp: PDF
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Authors:
Choi, G. W.; Lee, W. S. (Department of Electrical Engineering, Chosun University, Gwangju 501-759, South Korea)
Seo, Y. J. (Department of Electrical Engineering, Daebul University, Youngam 526-702, South Korea)
Abstract:
The optimal process parameters were determined by using a design of experiment (DOE) approach for chemical-mechanical polishing of indium tin oxide with a sufficient removal amount and good planarity. The electrical and optical properties, such as current-voltage (I-V) curve and photoluminescence spectrum, were discussed in order to evaluate the possibility of the CMP application for an organic light emitting diode (OLED) device using an ITO film. The electrical I-V characteristics and optical properties of ITO thin film were improved after the CMP process using optimized process parameters compared to that of as-deposited thin film before the CMP process.