3-Dimensional bridged structures by thermal-UV imprint using a novel mask

Conference: EMLC 2008 - 24th European Mask and Lithography Conference
01/21/2008 - 01/24/2008 at Dresden, Germany

Proceedings: EMLC 2008

Pages: 2Language: englishTyp: PDF

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Okuda, Keisuke; Kawata, Hiroaki; Hirai, Yoshihiko (Graduate School of Engineering, Osaka Prefecture University, 1-1, Gakuen-cho, Naka-ku, Sakai, 599-8531, Osaka, Japan)

Nano imprint lithography (NIL) is expected to realize low cost fabrication of fine patterns. Besides its high resolution, the major advantage is the applicability to a wide range of structure sizes in both, lateral and depth dimensions, as demonstrated by fabrication of mixed structures (micro and nano dimensions) with the newly proposed hybrid nanoimprint. In this work, we report the first time about a single step procedure to fabricate 3- dimensional bridged structures by use of a novel type of mask similar to the one used in a hybrid nanoimprint process.