Variability Aware Sub-Wavelength Lithography Characterization for Robust SRAM Design
Conference: ARCS 2011 - 24th International Conference on Architecture of Computing Systems
02/22/2011 - 02/23/2011 at Como, Italy
Proceedings: ARCS 2011
Pages: 6Language: englishTyp: PDFPersonal VDE Members are entitled to a 10% discount on this title
Dobrovolný, Petr; Miranda, Miguel; Zuber, Paul (Imec, Kapeldreef 75, 3001 Leuven, Belgium)
This paper presents a tool flow to perform SRAM wide statistical analysis subject to litho and technology process variability. The tool flow is illustrated in few 45 and 32nm industry-grade SRAM vehicles. Selected case studies show how this tool flow successfully captures non-trivial statistical interactions between the SRAM cell and the periphery, otherwise less visible when using statistical electrical simulations of the critical path alone.