Design Guidelines towards Compact Litho-Friendly Regular cells
Conference: ARCS 2011 - 24th International Conference on Architecture of Computing Systems
02/22/2011 - 02/23/2011 at Como, Italy
Proceedings: ARCS 2011
Pages: 7Language: englishTyp: PDF
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Authors:
Gomez, Sergio; Moll, Francesc; Rubio, Antonio (Department of Electronic Engineering, Universitat Politècnica de Catalunya, Barcelona, Spain)
Elhøj, Martin; Schlinker, Guilherme (Nangate A/S, Herlev, Denmark)
Woolaway, Nigel (Leading Edge Snc, Brembate, Italy)
Abstract:
Integrated circuit design advances into the nanoscale era towards more compact, higher performance and lower power devices. However, the large number of transistors per die has entailed an increase of device variability due to sub-wavelength lithography and layout complexity impacting manufacturability. Therefore, regular designs has emerged as an alternative cell design style towards more litho-friendly designs aiming to combat the increase number of process variations in current nanoscale technologies and beyond. Thereby, several regular layout fabrics with various degrees of regularity that exploits the potential benefits of regular designs and an area overhead estimation thereof are provided throughout this work.