Effects of Magnetron Sputtering on Oblique Deposition of Magnetostrictive Thin Films
Conference: ACTUATOR 2018 - 16th International Conference on New Actuators
06/25/2018 - 06/27/2018 at Bremen, Deutschland
Proceedings: ACTUATOR 2018
Pages: 3Language: englishTyp: PDF
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Authors:
Tsukagoshi, Y.; Yamaguchi, K.; Yatagai, K.; Uchida, H. T.; Gemma, R.; Matsumura, Y. (Tokai University, Hiratsuka, Japan)
Abstract:
Effects of bias voltage and geometrical arrangement of substrate on internal stress and magnetostrictive characteristics of Ni thin films using by DC magnetron sputtering process were studied. Ni thin films were prepared on Si(100) substrate by obliquely DC magnetron sputtered deposition with various substrate bias voltage. Internal stress of Ni thin films was changed in tensile to compressive with an increase in ion bombardment parameter Π. Magnetostrictive susceptibility was also increased with an increase in ion bombardment parameter Π.