Method for extracting internal gate resistance of SiC MOSFETs from double-pulse measurements

Conference: PCIM Europe digital days 2020 - International Exhibition and Conference for Power Electronics, Intelligent Motion, Renewable Energy and Energy Management
07/07/2020 - 07/08/2020 at Deutschland

Proceedings: PCIM Europe digital days 2020

Pages: 7Language: englishTyp: PDF

Huerner, Andreas; Sochor, Paul; Elpelt, Rudolf (Infineon Technologies AG, Germany)

This paper discusses a new method for defining the internal gate resistance in behavioral compact models for SiC MOSFETs. The internal gate resistance is normally extracted from a small-signal analysis. However, due to the measurement conditions, the relevance of this method for the application is questionable. Therefore, a method to determine the internal gate resistance from double-pulse measurements was developed and is presented in this paper. It will be shown that with this method, it is possible to define the internal gate resistance by extracting the value from measurements taken under application-relevant conditions.