Qualification of the Barrier Properties of ALD-coated Polymer Films with Humidity Sensors

Conference: MikroSystemTechnik Kongress 2021 - Kongress
11/08/2021 - 11/10/2021 at Stuttgart-Ludwigsburg, Deutschland

Proceedings: MikroSystemTechnik Kongress 2021

Pages: 4Language: englishTyp: PDF

Authors:
Simon, Nicolai; Blendinger, Felix; Bucher, Volker (Institute for Applied Research, Furtwangen University, Furtwangen, Germany)
Passlack, Ulrike (Institute for Microelectronics, Stuttgart, Germany)
Stieglitz, Thomas (Institute for Microsystem Technology, Freiburg, Germany)

Abstract:
For the encapsulation of microelectronics or active implants, hermetically sealed, thin, and flexible materials are desirable. Research is focused on the deposition of ultra-thin metal oxide layers, which are deposited onto the substrates using the atomic layer deposition (ALD) process. The evaluation of such layers can be performed by the so-called water vapor transmission rate (WVTR). We present an inexpensive method for the determination of the effective WVTR by humidity sensors and a suitable experimental setup, in which we have measured three different layer systems with four different total thicknesses, which were applied on polymer films, for validation.