Microstructuring and Fine Tuning of Glass- And Silicon Nitride-Based Microsystems by Focused Electron-beam Irradiation

Abstract:
In this article, we discuss a new technology for a direct micro- and nanostructuring of silicate materials (glasses and thin films) and silicon nitride using focused electron beams and highlight possible applications. This so-called patterning by electron-beam activated relocation (PEAR) process was used to fine-tune glass- and silicon nitride-based microsystems locally and very selectively. We demonstrate that it is possible to modify surface structures and mechanical system properties in a relatively simple manner, even after complete microtechnical fabrication, for application-specific purposes.