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21

Ion Beam Deposition for Defect-Free EUVL Mask Blanks

Authors:
Kearney, Patrick; Lin, C. C.; Yun, Henry; Randive, Rajul; Reiss, Ira; Hayes, Alan; Mirkarimi, Paul
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

22

Lithography Development and Research Challenges for the = 22 nm Half-pitch

Authors:
Wurm, Stefan
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

23

Lithography light source challenges for Double Patterning and EUVL

Authors:
Farrar, Nigel R.; Lalovic, Ivan; Brandt, David; Brown, Daniel
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

24

MAPPER: High Throughput Maskless Lithography

Authors:
Kuiper, V.; Kampherbeek, B. J.; Wieland, M. J.; Boer, G. de; Berge, G. F. ten; Boers, J.; Jager, R.; Peut, T. van de; Peijster, J. J. M.; Slot, E.; Steenbrink, S. W. H. K.; Teepen, T. F.; Veen, A. H. V. van
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

25

Mask contribution on CD & OVL errors budgets for Double Patterning Lithography

Authors:
Servin, I.; Lapeyre, C.; Barnola, S.; Connolly, B.; Ploss, R.; Nakagawa, K.; Buck, P.; McCallum, M.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

26

Mask Industry Assessment Trend Analysis

Authors:
Hughes, Greg; Yun, Henry
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

27

Mask parameter variation in the context of the overall variation budget of an advanced logic wafer Fab

Authors:
Seltmann, Rolf; Burbach, Gert; Parge, Anne; Busch, Jens; Hertzsch, Tino; Poock, Andre; Weisbuch, Francois; Holfeld, Andre
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

28

Mask salvage in the age of capital contraction

Authors:
Kimmel, Kurt R.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

29

MeRiT(R) repair verification using in-die phase metrology Phame(R)

Authors:
Buttgereit, Ute; Birkner, Robert; Stelzner, Robert
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

30

Molecular dynamics study on mold fracture by nano scale defects in nanoimprint lithography

Authors:
Tada, K.; Yasuda, M.; Fujii, N.; Kawata, H.; Hirai, Y.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

31

Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration Metrol

Authors:
Arnz, M.; Klose, G.; Troll, G.; Beyer, D.; Mueller, A.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

32

Mounting Methodologies to Measure EUV Reticle Nonflatness

Authors:
Battula, Venkata Siva; Zeuske, Jacob R.; Engelstad, Roxann L.; Vukkadala, Pradeep; Mikkelson, Andrew R.; Peski, Chris K. Van
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

33

New methods and processes based on advanced vacuum technology for photomask decontamination

Authors:
Foray, J. M.; Bellet, B.; HadjRabah, S.; Palisson, J.; Veran, E.; Davenet, M.; Favre, A.; Sergent, P.; Tissier, M.; Baudiquez, V.; Nesladek, P.; Foca, E.; Gopalakrishnan, S.; Hollein, I.; Dufaye, F.; Gough, S.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

34

New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodes

Authors:
Martin, L.; Manakli, S.; Icard, B.; Pradelles, J.; Orobtchouk, Régis; Poncet, Alain; Pain, L.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

35

Nuisance Event Reduction Using Sensitivity Control Layers (SCL) for Advanced Photomask Inspection

Authors:
Hedges, Shad; Le, Chin; Eickhoff, Mark; Wylie, Mark; Simmons, Tim; Vellanki, Venu; McMurran, Jeff
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

36

Particle transport and reattachment on a mask surface

Authors:
Nesladek, Pavel; Osborne, Steve; Kohl, Christian
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

37

Reduced Pellicle Impact on Overlay using High Order Intrafield Grid Corrections

Authors:
Kruif, Robert de; Rhee, Tasja van; Heijden, Eddy van der
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

38

Registration Metrology on Double Patterning Reticles

Authors:
Schmidt, Karl-Heinrich; Röth, Klaus-Dieter; Laske, Frank; Bender, Jochen; Adam, Dieter; Ache, Oliver
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

39

Residual-free imprint for sensor definition

Authors:
Mayer, A.; Bogdanski, N.; Möllenbeck, S.; Scheer, H.-C.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference

40

Resolution capability of EBM-6000 and EBM-7000 for Nano-imprint template

Authors:
Yoshitake, S.; Kamikubo, T.
Conference:
EMLC 2009 - 25th European Mask and Lithography Conference