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21

Key improvement Schemes of Accuracies in EB Mask Writing for Double Patterning Lithography

Authors:
Sunaoshi, Hitoshi; Kamikubo, Takashi; Nishimura, Rieko; Tsuruta, Kaoru; Katsumata, Takehiko; Ohnishi, Takayuki; Anze, Hirohito; Takamatsu, Jun; Yoshitake, Shusuke; Tamamushi, Shuichi
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

22

Mask CD measurement approach by diffraction intensity for lithography equivalent

Authors:
Nagai, Takaharu; Mesuda, Kei; Sutou, Takanori; Inazuki, Yuichi; Hashimoto, Hiroyuki; Yokoyama, Toshifumi; Toyama, Nobuhito; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

23

Mask Data Rank (MDR) and its Application

Authors:
Kato, Kokoro; Endo, Masakazu; Inoue, Tadao; Yamabe, Masaki
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

24

Mask Industry Assessment Trend Analysis

Authors:
Shelden, Gilbert; Marmillion, Patrica; Hughes, Greg
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

25

Measuring Contact Hole Corner Rounding Uniformity Using Optical Scatterometry

Authors:
Lam, John C.; Gray, Alexander; Chen, Stanley; Richter, Jan
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

26

MEDEA+ project 2T302 MUSCLE “Masks through user’s supply chain: leadership by excellence”

Authors:
Torsy, Andreas; Torsy, Andreas
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

27

New alignment marks for improved measurement maturity

Authors:
Weidenmueller, U.; Alves, H.; Schnabel, B.; Icard, B.; Le-Denmat, J-C.; Manakli, S.; Pradelles, J.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

28

New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA Condenser

Authors:
Hillmann, Frank; Scheuring, Gerd; Brück, Hans-Jürgen
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

29

Optical Proximity Correction for 0.13 µm SiGe:C BiCMOS

Authors:
Geisler, S.; Geisler, S.; Bauer, J.; Haak, U.; Jagdhold, U.; Pliquett, R.; Matthus, E.; Schrader, R.; Wolf, H.; Baetz, U.; Beyer, H.; Niehoff, M.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

30

Overcoming Mask Etch Challenges for 45 nm & Beyond

Authors:
Chandrachood, M.; Leung, T.  Y. B.; Yu, K.; Grimbergen, M.; Panayil, S.; Ibrahim, I.; Sabharwal, A.; Kumar, A.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

31

Phame(R) - high resolution off-axis phase shift measurements on 45nm node features

Authors:
Buttgereit, Ute; Perlitz, Sascha; Seidel, Dirk
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

32

Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyond

Authors:
Ehrlich, Christian; Buttgereit, Ute; Boehm, Klaus; Scheruebl, Thomas; Edinger, Klaus; Bret, Tristan
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

33

Photomask cleaning process improvement to minimize ArF haze

Authors:
Graham, Michael; McDonald, Andrew
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

34

Polarization-induced astigmatism caused by topographic masks

Authors:
Ruoff, Johannes; Neumann, Jens Timo; Schmitt-Weaver, Emil; Setten, Eelco van; Masson, Nicolas le; Progler, Chris; Geh, Bernd; Geh, Bernd
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

35

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Authors:
Kushida, Yasuyuki; Handa, Hitoshi; Maruyama, Hiroshi; Abe, Yuuki; Fujimura, Yukihiro; Yokoyama, Toshifumi
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

36

Printing of sub resolution shots in electron beam direct write with variable shaped beam machines

Authors:
Thrum, Frank; Kretz, Johannes; Hohle, Christoph; Choi, Kang-Hoon; Keil, Katja
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

37

Progress of Nil Template Making

Authors:
Yusa, Satoshi; Hiraka, Takaaki; Mizuochi, Jun; Fujii, Akiko; Sakai, Yuko; Kuriyama, Koki; Sakaki, Masashi; Sasaki, Shiho; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

38

Status of EUVL Reticle Chucking

Authors:
Engelstad, Roxann L.; Sohn, Jaewoong; Zeuske, Jacob R.; Battul, Venkata Siva; Vukkadala, Pradeep; Peski, Chris K. Van; Orvek, Kevin J.; Turner, Kevin T.; Mikkelson, Andrew R.; Nataraju, Madhura
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

39

Strategies for hybrid techniques of UV lithography and thermal nanoimprint

Authors:
Wissen, M.; Bogdanski, N.; Moellenbeck, S.; Scheer, H.-C.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference

40

Theoretical Study of Mask Haze Formation

Authors:
Wu, Banqiu; Kumar, Ajay
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference