21
Key improvement Schemes of Accuracies in EB Mask Writing for Double Patterning Lithography
Authors:
Sunaoshi, Hitoshi; Kamikubo, Takashi; Nishimura, Rieko; Tsuruta, Kaoru; Katsumata, Takehiko; Ohnishi, Takayuki; Anze, Hirohito; Takamatsu, Jun; Yoshitake, Shusuke; Tamamushi, Shuichi
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
22
Mask CD measurement approach by diffraction intensity for lithography equivalent
Authors:
Nagai, Takaharu; Mesuda, Kei; Sutou, Takanori; Inazuki, Yuichi; Hashimoto, Hiroyuki; Yokoyama, Toshifumi; Toyama, Nobuhito; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
23
Mask Data Rank (MDR) and its Application
Authors:
Kato, Kokoro; Endo, Masakazu; Inoue, Tadao; Yamabe, Masaki
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
24
Mask Industry Assessment Trend Analysis
Authors:
Shelden, Gilbert; Marmillion, Patrica; Hughes, Greg
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
25
Measuring Contact Hole Corner Rounding Uniformity Using Optical Scatterometry
Authors:
Lam, John C.; Gray, Alexander; Chen, Stanley; Richter, Jan
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
26
MEDEA+ project 2T302 MUSCLE “Masks through user’s supply chain: leadership by excellence”
Authors:
Torsy, Andreas; Torsy, Andreas
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
27
New alignment marks for improved measurement maturity
Authors:
Weidenmueller, U.; Alves, H.; Schnabel, B.; Icard, B.; Le-Denmat, J-C.; Manakli, S.; Pradelles, J.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
28
New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA Condenser
Authors:
Hillmann, Frank; Scheuring, Gerd; Brück, Hans-Jürgen
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
29
Optical Proximity Correction for 0.13 µm SiGe:C BiCMOS
Authors:
Geisler, S.; Geisler, S.; Bauer, J.; Haak, U.; Jagdhold, U.; Pliquett, R.; Matthus, E.; Schrader, R.; Wolf, H.; Baetz, U.; Beyer, H.; Niehoff, M.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
30
Overcoming Mask Etch Challenges for 45 nm & Beyond
Authors:
Chandrachood, M.; Leung, T. Y. B.; Yu, K.; Grimbergen, M.; Panayil, S.; Ibrahim, I.; Sabharwal, A.; Kumar, A.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
31
Phame(R) - high resolution off-axis phase shift measurements on 45nm node features
Authors:
Buttgereit, Ute; Perlitz, Sascha; Seidel, Dirk
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
32
Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyond
Authors:
Ehrlich, Christian; Buttgereit, Ute; Boehm, Klaus; Scheruebl, Thomas; Edinger, Klaus; Bret, Tristan
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
33
Photomask cleaning process improvement to minimize ArF haze
Authors:
Graham, Michael; McDonald, Andrew
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
34
Polarization-induced astigmatism caused by topographic masks
Authors:
Ruoff, Johannes; Neumann, Jens Timo; Schmitt-Weaver, Emil; Setten, Eelco van; Masson, Nicolas le; Progler, Chris; Geh, Bernd; Geh, Bernd
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
35
Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond
Authors:
Kushida, Yasuyuki; Handa, Hitoshi; Maruyama, Hiroshi; Abe, Yuuki; Fujimura, Yukihiro; Yokoyama, Toshifumi
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
36
Printing of sub resolution shots in electron beam direct write with variable shaped beam machines
Authors:
Thrum, Frank; Kretz, Johannes; Hohle, Christoph; Choi, Kang-Hoon; Keil, Katja
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
37
Progress of Nil Template Making
Authors:
Yusa, Satoshi; Hiraka, Takaaki; Mizuochi, Jun; Fujii, Akiko; Sakai, Yuko; Kuriyama, Koki; Sakaki, Masashi; Sasaki, Shiho; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
38
Status of EUVL Reticle Chucking
Authors:
Engelstad, Roxann L.; Sohn, Jaewoong; Zeuske, Jacob R.; Battul, Venkata Siva; Vukkadala, Pradeep; Peski, Chris K. Van; Orvek, Kevin J.; Turner, Kevin T.; Mikkelson, Andrew R.; Nataraju, Madhura
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
39
Strategies for hybrid techniques of UV lithography and thermal nanoimprint
Authors:
Wissen, M.; Bogdanski, N.; Moellenbeck, S.; Scheer, H.-C.
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference
40
Theoretical Study of Mask Haze Formation
Authors:
Wu, Banqiu; Kumar, Ajay
Conference:
EMLC 2008 - 24th European Mask and Lithography Conference