1
Mask Costs, A New Look
Authors:
Grenon, Brian J.; Hector, Scott
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
2
Mask Industry Assessment Trend Analysis
Authors:
Shelden, Gilbert; Hector, Scott; Marmillion, Patricia; Lercel, Michael
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
3
Multi-Project Reticle Design andWafer Dicing under Uncertain Demand
Authors:
Kahng, Andrew B.; Mandoiu, Ion; Xu, Xu; Zelikovsky, Alex Z.
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
4
ORC and LfD as First Steps towards DfM
Authors:
März, Reinhard; Peter, Kai; Maurer, Wilhelm
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
5
Patterning process development for NIL templates
Authors:
Sasaki, Shiho; Yoshida, Yuuichi; Amano, Tsuyoshi; Itoh, Kimio; Toyama, Nobuhito; Mohri, Hiroshi; Hayashi, Naoya
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
6
Plasma deposited and evaporated thin resists for template fabrication
Authors:
Lavallée, Eric; Beauvais, Jacques; Mangoua, Bertrand Takam; Drouin, Dominique
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
7
Printability study with polarization based AIMS(TM) fab 193i to investigate mask polarization effects
Authors:
Zibold, Axel; Stroessner, Ulrich; Poortinga, Eric; Schmid, Rainer; Scherübl, Thomas; Rosenkranz, Norbert; Harnisch, Wolfgang
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
8
Rigorous Mask Modeling beyond the Hopkins Approach
Authors:
Schermer, J.; Evanschitzky, P.; Erdmann, A.
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
9
Standardisation of photomask orders: An automation perspective
Authors:
Houssos, Nikos; Parchas, Evangelos; Stavroulakis, Stelios; Voyiatzis, Emmanuel; Torsy, Andreas; Filies, Olaf
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
10
Sub-110 nm line width standards for accuracy calibration of CD-SEM and CD-AFM
Authors:
Shirke, Sanjay; Lorusso, Gian; Blanquies, René; Vandeweyer, Tom
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
11
Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask
Authors:
Gans, F.; Liebe, R.; Heins, Th.; Richter, J.; Häßler-Grohne, W.; Frase, C. G.; Bodermann, B.; Czerkas, S.; Dirscherl, K.; Bosse, H.
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
12
The Magic of 4X Mask Reduction Factor?
Authors:
Lercel, Michael
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
13
The Status of LEEPL: Can it be an alternative solution?
Authors:
Utsumi, Takao
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
14
Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography
Authors:
Konishi, Toshio; Kojima, Yosuke; Okuda, Yoshimitsu; Philipsen, Vicky; Leunissen, Leonardus H. A.; Look, Lieve Van
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference
15
Using Design Intent to Qualify and Control Lithography Manufacturing
Authors:
Vasek, Jim; Wilkinson, Bill; Smith, Dave; Reich, Al; Garza, Cesar; Wiley, Jim; Zhao, Joyce; Poyastro, Moshe; Troy, Brian; Nehmadi, Youval; Abraham, Zamir
Conference:
EMLC 2006 - 22nd European Mask and Lithography Conference