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41

Three Dimensional Mask Effects in OPC Process Model Development From First Principles Simulation

Autoren:
Melvin III, Lawrence S.; Schmoeller, Thomas; Kalus, Christian K.; Lia, Jianliang
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference

42

Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface

Autoren:
Ganesan, Ramakrishnan; Youn, Seul Ki; Yun, Jei-Moon; Kim, Jin-Baek
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference

43

Topological and Model Based approach to Pitch decomposition for Double Patterning

Autoren:
Nikolsky, Peter; Davydova, Natalia; Goossens, Ronald
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference

44

Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasks

Autoren:
Scholze, Frank; Laubis, Christian
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference

45

Very High Sensitivity Mask DUV Transmittance Mapping and Measurements Based on Non Imaging Optics

Autoren:
Ben-Zvi, Guy; Dmitriev, Vladimir; Graitzer, Erez; Zait, Eitan; Sharoni, Ofir; Cohen, Avi
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference

46

Wafer Based Mask Characterization for Double Patterning Lithography

Autoren:
Kruif, Robert de; Bubke, Karsten; Janssen, Gert-Jan; Heijden, Eddy van der; Fochler, Jörg; Dusa, Mircea; Peters, Jan Hendrik; Haas, Paul de; Connolly, Brid
Konferenz:
EMLC 2008 - 24th European Mask and Lithography Conference