Optimisation of surface quality of 3D silicon master forms for injection molding of optical micro elements
Konferenz: MikroSystemTechnik - KONGRESS 2009
12.10.2009 - 14.10.2009 in Berlin, Germany
Tagungsband: MikroSystemTechnik
Seiten: 4Sprache: EnglischTyp: PDF
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Autoren:
Ivanov, A.; Kovacs, A.; Mescheder, U. (Institut für Angewandte Forschung Furtwangen, 78120 Furtwangen)
Kovacs, A.; Mescheder, U. (Fakultät Computer and Electrical Engineering, Hochschule Furtwangen University, 78120 Furtwangen)
Kuhn, S.; Kübler, M.; Burr, A. (Polymer-Institut Kunststofftechnik, Hochschule Heilbronn, 74081 Heilbronn)
Inhalt:
In this paper application of electrochemical etching of silicon (anodization) in hydrofluoric acid based electrolytes is studied for the fabrication of 3D mold inserts for injection molding of optical plastic parts. The investigation and optimization of the electropolishing step in a 3D silicon form fabrication process by adjusting the concentration of hydrofluoric acid and current density is presented. The overall process to produce particular application-oriented silicon molds and injection molded polymer products is qualified in terms of surface quality.