Nanoimprint lithography for photonic devices

Konferenz: IPRM 2011 - 23th International Conference on Indium Phosphide and Related Materials
22.05.2011 - 26.05.2011 in Berlin, Germany

Tagungsband: IPRM 2011

Seiten: 4Sprache: EnglischTyp: PDF

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Niemi, Tapio (Optoelectronics Research Centre, Tampere University of Technology, PO Box 692, FI-33101 Tampere, Finland)

Photonic devices, especially nanostructured components, play a key role in the integration of photonic devices and advanced applications. Cost and processing time are some of the bottlenecks of present nanolithography in the mass production of various structures and devices. Nanoimprint lithography is one of the candidates to reduce the cost and replication time. This presentation summarizes various devices we have realized by utilizing nanoimprint lithography for nanopatterning compound semiconductors and metals.