Structural evaluation of InGaAs/GaAsP multiple quantum wells via in-situ wafer’s curvature measurement and ex-situ X-ray diffraction
Konferenz: IPRM 2011 - 23th International Conference on Indium Phosphide and Related Materials
22.05.2011 - 26.05.2011 in Berlin, Germany
Tagungsband: IPRM 2011
Seiten: 4Sprache: EnglischTyp: PDF
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Autoren:
Sodabanlu, H.; Watanabe, K.; Nakano, Y. (Research Center for Advance Science and Technology, The University of Tokyo, Japan)
Ma, S. J.; Sugiyama, M.; Nakano, Y. (School of Engineering, The University of Tokyo, Japan)
Inhalt:
We have developed the calculation technique using wafer’s curvature and X-ray diffraction (XRD) pattern to analyze the structure of InGaAs/GaAsP multiple quantum wells (MQWs) grown by metalorganic vapor phase epitaxy (MOVPE). Instead of using difficult and time consuming XRD reciprocal space mapping (RSM), the curvature can effectively supplement the uncertain information of MQWs obtained from XRD 2theta-ω scan. We have proposed an alternative method to determine the physical parameters of MQWs structure