Highly ordered silicon nanopillar by nanoparticle lithography

Konferenz: Mikro-Nano-Integration - 6. GMM-Workshop
05.10.2016 - 06.10.2016 in Duisburg, Deutschland

Tagungsband: GMM-Fb. 86: Mikro-Nano-Integration

Seiten: 5Sprache: EnglischTyp: PDF

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Autoren:
Hamdana, Gerry; Bertke, Maik; Wasisto, Hutomo Suryo; Peiner, Erwin (Institute of Semiconductor Technology, Technische Universität Braunschweig, 38106 Braunschweig, Germany & Laboratory for Emerging Nanotechnology (LENA), 38106 Braunschweig, Germany)
Südkamp, Tobias; Bracht, Hartmut (Institute of Material Physics, Westfällische Universität Münster, 48149 Münster, Germany)

Inhalt:
Large-area silicon nanostructure arrays were prepared by polystyrene spheres as processing mask. Utilizing a mesh array prepared by photolithography, the area of nanofabrication was pre-defined. More importantly, the fabricated lithographic structure and an improved hydrophilic surface enhanced the sphere transfer process. Therefore, the ordering depended not only on self-assembly but also could be controlled by mesh characteristics. Nanofabrication was performed by inductively coupled plasma (ICP) reactive ion etching (RIE) at cryogenic temperature.