Preparation of Ordered Mesoporous Si02/Mc N anocomposite Abrasives and Their Chemical Polishing Behavior on Fused Silicon Substrates
Konferenz: ICPT 2017 - International Conference on Planarization/CMP Technology
11.10.2017 - 13.10.2017 in Leuven, Belgium
Tagungsband: ICPT 2017
Seiten: 5Sprache: EnglischTyp: PDF
Persönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Autoren:
Li , Xu; Chunli, Zou; Guoshun, Pan (State Key Laboratory of Tribology, Tsinghua University, Beijing 10084, China & Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057, China & Guangdong Provincial Key Laboratory of Optomechatronics, Shenzhen 518057, China)
Xin, Zhang; Chengxi, Kang (State Key Laboratory of Tribology, Tsinghua University, Beijing 10084, China)
Guihai, Luo (Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057, China & Guangdong Provincial Key Laboratory of Optomechatronics, Shenzhen 518057, China)
Inhalt:
Abstract-Solid silica cores coated with mesoporous carbon material (lvf c) shells via a hydro-thermal raute using (3-Aminopropyl) trimethoxysiliane as silica source and triblock polymer Pluronic F 127 as a structure directing agent were synthesized in this work to be used as a novel abrasive particle. The obtained abrasives were characterized by scanning electronic microscopy, transmission electron microscopy and fourier transform infrared spectroscopy. The chemical mechanical polishing behaviors for fused silica were evaluated by atomic force microscopy. The results indicated that the as-prepared SiOJ/Mc composite abrasives gave a much lower surface roughness as well as lower topographical variations than that of traditional colloidal silica abrasives. The improved polishing performance might be attributed to the decrease of the elastic moduli and the improvement of the chemical and/or physical environments in the local contacting area between abrasive particles and wafer. Keywords: Mesoporous Nanocomposite Abrasives, Core/shell Structure, Fused Silica, CMP