Optimization of WC-Co Composition for CVD Diamond Pad Conditioner

Konferenz: ICPT 2017 - International Conference on Planarization/CMP Technology
11.10.2017 - 13.10.2017 in Leuven, Belgium

Tagungsband: ICPT 2017

Seiten: 5Sprache: EnglischTyp: PDF

Persönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt

Autoren:
Kim, Myeong-Jun; Ryu, Heon-Yul; Lee, Jung-Hwan (Department of Bio-Nano Technology, Hanyang University ERICA, Ansan 15588, Korea)
Kim, Ji-Woo; Cho, Sooji; Hyun, Dabin; Jee, Hae-geun (SAESOL Diamond Ind. Co. Ltd., Ansan, 15423, Korea)
Park, Jin-Goo (Department of Bio-Nano Technology & Department of Materials Science and Chemical, Hanyang University ERICA, Ansan 15588, Korea)

Inhalt:
CVD diamond coated pad conditioner is known to show better chemical resistance and pad surface profile than the standard pad conditioner. This work reports the preparation of WC-Co alloy pellet as a body material for CVD pad conditioner. WC-Co pellets were made with different sizes of WC powders as a function of Co concentration. The pad conditioner with relatively smaller WC grain size and lower Co content shows the highest wear resistance. Keywords: Chemical mechanical planarization, Pad conditioner, WC-Co alloy, Hot-filament CVD diamond film, Wear resistance