Two-Photon Lithography Parameter Study for Manufacturing of Acoustic Metamaterials on MEMS

Konferenz: MikroSystemTechnik Kongress 2021 - Kongress
08.11.2021 - 10.11.2021 in Stuttgart-Ludwigsburg, Deutschland

Tagungsband: MikroSystemTechnik Kongress 2021

Seiten: 4Sprache: EnglischTyp: PDF

Schweiger, Severin; Melnikov, Anton; Koch, Sandro G. (Fraunhofer Institute for Photonic Microsystems, Dresden, Germany)
Schenk, Harald (Brandenburgische Technische Universität Cottbus-Senftenberg, Germany)

Acoustic impedance matching structures can be used on capacitive micromachined ultrasonic transducers (CMUT) to increase acoustic energy transmission into the load medium. Our contribution contains a systematic study of the viability of the two-photon-polymerization lithography process for the fabrication of acoustic impedance matching metamaterials. For this purpose, acoustic simulations were conducted to find optimized dimensions of the matching structure. Based on the proposed dimensions, parameter sweeps were manufactured on substitute substrates, resulting in a viable parameter space for the direct fabrication on CMUT devices.