Qualification of the Barrier Properties of ALD-coated Polymer Films with Humidity Sensors

Konferenz: MikroSystemTechnik Kongress 2021 - Kongress
08.11.2021 - 10.11.2021 in Stuttgart-Ludwigsburg, Deutschland

Tagungsband: MikroSystemTechnik Kongress 2021

Seiten: 4Sprache: EnglischTyp: PDF

Simon, Nicolai; Blendinger, Felix; Bucher, Volker (Institute for Applied Research, Furtwangen University, Furtwangen, Germany)
Passlack, Ulrike (Institute for Microelectronics, Stuttgart, Germany)
Stieglitz, Thomas (Institute for Microsystem Technology, Freiburg, Germany)

For the encapsulation of microelectronics or active implants, hermetically sealed, thin, and flexible materials are desirable. Research is focused on the deposition of ultra-thin metal oxide layers, which are deposited onto the substrates using the atomic layer deposition (ALD) process. The evaluation of such layers can be performed by the so-called water vapor transmission rate (WVTR). We present an inexpensive method for the determination of the effective WVTR by humidity sensors and a suitable experimental setup, in which we have measured three different layer systems with four different total thicknesses, which were applied on polymer films, for validation.