Rigorous Mask Modeling beyond the Hopkins Approach

Konferenz: EMLC 2006 - 22nd European Mask and Lithography Conference
23.01.2006 - 26.01.2006 in Dresden, Germany

Tagungsband: EMLC 2006

Seiten: 6Sprache: EnglischTyp: PDF

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Schermer, J.; Evanschitzky, P.; Erdmann, A. (Fraunhofer-Institute of Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany)

This paper presents the implementation of an imaging algorithm that extends the Hopkins approach in order to cope with the demanding requirements of state of the art lithography. Rigorous mask simulation for oblique angles of incidence is integrated into our model of a lithographic projection system. In order to show the capabilites, Chromeless Phase Lithography (CPL) masks are studied with the new implementation. Immersion conditions are applied and a benchmark against the Hopkins approximation is carried out. An impact on aerial-image formation and on lithographic-process simulation is shown. It is possible, that the approach will be relevant for mask optimization.