Consequences of Plasmonic Effects in Photomasks

Konferenz: EMLC 2006 - 22nd European Mask and Lithography Conference
23.01.2006 - 26.01.2006 in Dresden, Germany

Tagungsband: EMLC 2006

Seiten: 2Sprache: EnglischTyp: PDF

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Schellenberg, F. M.; Adam, K. (Mentor Graphics, 1001 Ridder Park Dr., San Jose, CA, 95131)
Matteo, J.; Hesselink, L. (Stanford University, Stanford, CA 94305)

In the implementation of most resolution enhancement techniques (RET) for optical lithography, full 3-D simulation of the wave propagation and scattering through the mask apertures must be computed for situations when ‘scalar’ approximations no longer hold. Using commercial 3-D electromagnetic solvers such as the program TEMPEST, some topography effects due to scattering, such as the intensity imbalance observed in phase masks, can be accurately predicted.