?omplete set of the special process equipment for the defect-free production of reticles
Konferenz: EMLC 2007 - 23rd European Mask and Lithography Conference
22.01.2007 - 26.01.2007 in Grenoble, France
Tagungsband: EMLC 2007
Seiten: 9Sprache: EnglischTyp: PDFPersönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Avakaw, Syarhei; Iouditski, Valerian; Pushkin, Leanid; Tsitko, Alena (UE "KBTEM-OMO" of "Planar", Partizansky Ave., 2, 220763 Minsk, Republic of Belarus)
The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: - Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR. - Advantages in the development of a complete set of the special process equipment. Without taking into account technical and chemical processes, this complete set includes three component parts: - Multi-beam laser pattern generator; - Die-to-Database reticle inspection system; - Laser reticle repair system.