Okuda, Keisuke; Niimi, Naoyuki; Kawata, Hiroaki; Hirai, Yoshihiko (Department of Physisc and Electronics Engineering, Osaka Prefecture University, 1-1, Gakuen-cho, Nakaku, Sakai, Osaka, 599-8531, Japan)
Hybrid patterning by thermal and UV nanoimprint lithography is newly proposed to fabricate micro-nano mixture structures. The SU-8 resist is thermally imprinted using the quartz mold, which has fine nano structures and micro Cr blank patterns. After the thermal nanoimprint, UV is exposed keeping the mold on the resist through the mold. Then, the mold is detached and the resist is developed to fabricate micro structures. Using this process, micro gratings having 40micrometer in width and 20 µm in depth nano dots pattern, which has 200 nm feature size is successfully demonstrated.