Fast near field simulation of optical and EUV masks using the waveguide method

Konferenz: EMLC 2007 - 23rd European Mask and Lithography Conference
22.01.2007 - 26.01.2007 in Grenoble, France

Tagungsband: EMLC 2007

Seiten: 12Sprache: EnglischTyp: PDF

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Evanschitzky, Peter; Erdmann, Andreas (Fraunhofer Institute Integrated Systems and Device Technology (Fraunhofer IISB), Schottkystrasse 10, 91058 Erlangen, Germany)

A new and optimized waveguide based electromagnetic field solver for optical and EUV mask simulations is presented. After an introduction of the waveguide method, the convergence and speed optimization and the adaptation of the method to optical and EUV lithography mask simulations are presented. Additionally a model for the simulation of EUV multilayer defects and an optimized decomposition technique for three dimensional waveguide simulations enabling very fast computations as well as large mask area simulations is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV masks.