Improvements of Electrical and Optical Property of Organic Light Emitting Diode using Chemical Mechanical Polishing Process
Konferenz: ICPT 2007 - International Conference on Planarization / CMP Technology
25.10.2007 - 27.10.2007 in Dresden, Germany
Tagungsband: ICPT 2007
Seiten: 6Sprache: EnglischTyp: PDFPersönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Choi, G. W.; Lee, W. S. (Department of Electrical Engineering, Chosun University, Gwangju 501-759, South Korea)
Seo, Y. J. (Department of Electrical Engineering, Daebul University, Youngam 526-702, South Korea)
The optimal process parameters were determined by using a design of experiment (DOE) approach for chemical-mechanical polishing of indium tin oxide with a sufficient removal amount and good planarity. The electrical and optical properties, such as current-voltage (I-V) curve and photoluminescence spectrum, were discussed in order to evaluate the possibility of the CMP application for an organic light emitting diode (OLED) device using an ITO film. The electrical I-V characteristics and optical properties of ITO thin film were improved after the CMP process using optimized process parameters compared to that of as-deposited thin film before the CMP process.