Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
Konferenz: EMLC 2008 - 24th European Mask and Lithography Conference
21.01.2008 - 24.01.2008 in Dresden, Germany
Tagungsband: EMLC 2008
Seiten: 10Sprache: EnglischTyp: PDFPersönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Shao, Feng; Evanschitzky, Peter; Reibold, David; Erdmann, Andreas (Fraunhofer Institute of Integrated Systems and Device Technology (Fraunhofer IISB), Schottkystrasse 10, 91058 Erlangen, Germany)
A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask simulations based on a parallelized decomposition technique (Q3D, “Q” stands for “quasi”). After a short introduction to the waveguide method and to an optimized mask description, the basis of the decomposition technique and its parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of computation time using parallelization is demonstrated.