Printing of sub resolution shots in electron beam direct write with variable shaped beam machines

Konferenz: EMLC 2008 - 24th European Mask and Lithography Conference
21.01.2008 - 24.01.2008 in Dresden, Germany

Tagungsband: EMLC 2008

Seiten: 6Sprache: EnglischTyp: PDF

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Thrum, Frank; Kretz, Johannes; Hohle, Christoph; Choi, Kang-Hoon (Qimonda Dresden GmbH & Co. OHG, D-01099 Dresden / Germany)
Keil, Katja (Fraunhofer Center for Nanoelectronic Technologies (CNT), Koenigsbruecker Straße 180, D-01099 Dresden / Germany)

The resolution of a variable shaped beam writer is typically given for the standard geometries like isolated line, isolated space, and dense (1:1) line/space pattern. It is related to the imaging power of both the tool itself as well as the resist process. In this paper we concentrate on small shots with dimensions smaller than the resolution limit, butting to a larger shot. We show experimentally that for a line resolution of 40 nm the resolution for butting sub resolution shots can be as small as 20 nm.