Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and Materials
Konferenz: EMLC 2008 - 24th European Mask and Lithography Conference
21.01.2008 - 24.01.2008 in Dresden, Germany
Tagungsband: EMLC 2008
Seiten: 8Sprache: EnglischTyp: PDFPersönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Klukowska, Anna; Vogler, Marko; Kolander, Anett; Reuther, Freimut; Gruetzner, Gabi (micro resist technology GmbH, 325 Koepenicker Str. H211, 12555 Berlin, Germany)
Muehlberger, Michael; Bergmair, Iris; Schoeftner, Rainer (Profactor Produktionsforschungs GmbH, Im Stadtgut A2, A-4407 Steyr-Gleink, Austria)
The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.