Design of pattern-specific mask grating for giving the effect of an off-axis illumination
Konferenz: EMLC 2008 - 24th European Mask and Lithography Conference
21.01.2008 - 24.01.2008 in Dresden, Germany
Tagungsband: EMLC 2008
Seiten: 9Sprache: EnglischTyp: PDF
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Autoren:
Kim, Young-Seok; O, Beom-Hoan; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol (MicroPhotonics Advanced Research Center, School of Information and Communication, Engineering, INHA University, 253 Yonghyun-Dong, Nam-Gu, Incheon, 402-751, Korea)
Song, Seok Ho (Department of Physics, Hanyang University, Hengdang-dong 17, Songdong-gu, Seoul, Korea)
Lee, Jong Ung (Laser & Optical Information Engineering, Cheongju University, 36, Naedok-dong, Sangdang-gu, Chungju-si, Chungbuk, Korea)
Oh, Sung Hyun; Choi, Yong Kyoo; Kim, Munsik (Hynix Semiconductor Inc., Hyangjeong-dong, Hungduk-gu, Chungju-si, Chungbuk, Korea)
Inhalt:
In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves.