Effect of Hot-filament Emitter on Magnetostrictive Thin Film Formation by Ion-plating Process
Konferenz: ACTUATOR 2018 - 16th International Conference on New Actuators
25.06.2018 - 27.06.2018 in Bremen, Deutschland
Tagungsband: ACTUATOR 2018
Seiten: 4Sprache: EnglischTyp: PDFPersönliche VDE-Mitglieder erhalten auf diesen Artikel 10% Rabatt
Arai, N.; Shinooka, M.; Yatagai, K.; Gemma, R.; Uchida, H. T.; Matsumura, Y. (Tokai University, Hiratsuka, Japan)
In this study, magnetostrictive thin films were prepared by ion plating process with a hot-filament electron emitter. In this type of ion plating process, highly excess energy can be introduced into deposited films. The excess energy of metal vapour particles is dependent not only on the kinetic energy of metal vapour ions but also on the ionization rate as the impinging rate of the ions on the substrate. The hot-filament electron emitter was used to increase the ionization rate. The ionization rate of Ni particles (ZNi+/ZNi) increased with electrons emission. The hot-filament electron emitter is effective in increasing the excess energy. It can be noted that effects of hot-filament electron emitter could be helpful to control solid solubility limit of thin film formation by ion plating process.