41
Masks for Flash Memory Gates for the 45nm node: Binary or attenuated?
Autoren:
Setten, Eelco van; Engelen, Andre; Finders, Jo; Dusa, Mircea
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
42
Metrology capabilities and performance of the new DUV Scatterometer of the PTB
Autoren:
Wurm, Matthias; Bodermann, Bernd; Pilarski, Frank
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
43
New Approach for Defect Inspection on Large Area Masks
Autoren:
Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
44
OPC Structures for Maskshops Qualification for the CMOS65nm and CMOS45nm Nodes
Autoren:
Sundermann, Frank; Trouiller, Yorick; Urbani, Jean-Christophe; Couderc, Christophe; Belledent, Jérôme; Borjon, Amandine; Foussadier, Franck; Gardin, Christian; LeCam, Laurent; Rody, Yves; Saied, Mazen; Yesilada, Emek; Martinelli, Catherine; Wilkinson, Bill; Vautrin, Florent; Morgana, Nicolo; Robert, Frederic; Montgomery, Patrick; Kerrien, Gurwan; Planchot, Jonathan; Farys, Vincent; Maria, Jean-Luc Di
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
45
Optimization of Source Distribution for half-wavelength DOE
Autoren:
Horiguchi, Ryuji; Toyama, Nobuhito; Itoh, Kimio; Yoshida, Kouji; Kurihara, Masaaki
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
46
Predicting and Correcting for Image Placement Errors during the Fabrication of EUVL Masks
Autoren:
Engelstad, R.; Sohn, J.; Mikkelson, A.; Nataraju, M.; Turner, K.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
47
Production Evaluation of Automated Reticle Defect Printability Prediction Application
Autoren:
Howard, William B.; Pomeroy, Scott; Moses, Raphael; Thaler, Thomas
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
48
Programmed Defects Study on masks for 45nm Immersion Lithography using the novel AIMS(TM)45-193i
Autoren:
Scherübl, Thomas; Dürr, Arndt C.; Böhm, Klaus; Birkner, Robert; Richter, Rigo; Strößner, Ulrich
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
49
Progress in EUV Photoresist Technology
Autoren:
Wallow, Thomas I.; Kim, Ryoung-han; Fontaine, Bruno La; Naulleau, Patrick P.; Anderson, Chris N.; Sandberg, Richard L.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
50
Quantitative Measurement of EUV Resist Outgassing
Autoren:
Denbeaux, Greg; Garg, Rashi; Waterman, Justin; Mbanaso, Chimaobi; Netten, Jeroen; Brainard, Robert; Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; DeMarco, Kevin; Jaffe, Molly; Waldron, Matthew; Dean, Kim
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
51
Resist and BARC organic outgassing measured by TD-GCMS: Investigation during the exposure or the bake steps of the lithographic process
Autoren:
Tiron, Raluca; Sourd, Claire; Fontaine, Hervé; Cetre, Sylviane; Mortini, Bénédicte
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
52
Reticle Haze: An Industrial Approach
Autoren:
Gough, Stuart; Gérard, Xavier; Bichebois, Pascal; Roche, Agnès; Sundermann, Frank; Guyader, Véronique; Bièron, Yann; Galvier, Jean; Nicoleau, Serge
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
53
Revisiting Mask Contact Hole Measurements
Autoren:
Higuchia, Masaru; Gallagher, Emily; Ceperley, Daniel; Brunner, Timothy; Bowley, Reg; McGuire, Anne
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
54
Status Report on EUV Source Development and EUV Source Applications in EUVL
Autoren:
Bakshi, Vivek; Lebert, Rainer; Jägle, Bernhard; Wies, Christian; Stamm, Uwe; Kleinschmidt, Juergen; Schriever, Guido; Ziener, Christian; Corthout, Marc; Pankert, Joseph; Bergmann, Klaus; Neff, Willi; Egbert, André; Gustafson, Debbie
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
55
Surface chemistry of Ru: relevance to optics lifetime in EUVL
Autoren:
Wasielewski, R.; Yakshinskiy, B. V.; Hedhili, M. N.; Ciszewski, A.; Madey, T. E.
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
56
The Effect of Intra-field CD Uniformity Control (CDC) on Mask Birefringence
Autoren:
Ben-Zvi, Guy; Zait, Eitan; Krugliakov, Vladimir; Dmitriev, Vladimir; Gottlieb, Gidi; Oshemkov, Sergey
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference
57
Time Resolved Evolution of the Etch Bias
Autoren:
Nesladek, Pavel; Paul, Jan
Konferenz:
EMLC 2007 - 23rd European Mask and Lithography Conference